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12 Dec 2005

Volume 87, Issue 24, Articles (24xxxx)

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Appl. Phys. Lett. 87, 243101 (2005); http://dx.doi.org/10.1063/1.2147713 (3 pages)

Y.-S. Choi, K. Hennessy, R. Sharma, E. Haberer, Y. Gao, S. P. DenBaars, S. Nakamura, E. L. Hu, and C. Meier
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Light emission of metal halide lamps under micro- and hypergravity conditions

W. W. Stoffels, P. C. M. Kemps, J. Beckers, G. M. W. Kroesen, and M. Haverlag

Appl. Phys. Lett. 87, 241501 (2005); http://dx.doi.org/10.1063/1.2137989 (3 pages) | Cited 8 times

Online Publication Date: 5 December 2005

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The wavelength-integrated light output from a metal halide discharge lamp is measured for gravity conditions varying from 0 to 1.8 g during parabolic flights. The results show that the changing gravity affects the convection flow in the lamp, which in turn changes the total light output. For vertically burning lamps, the sign and magnitude of the effect can be predicted using the demixing parameter: the ratio of typical diffusion to convection times. In horizontally burning lamps at 0 g, the absence of convective mixing results in a reduced light emission.
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52.25.Os Emission, absorption, and scattering of electromagnetic radiation
52.25.Fi Transport properties
52.30.-q Plasma dynamics and flow
52.80.Mg Arcs; sparks; lightning; atmospheric electricity

Dynamic imaging of 13.5 nm extreme ultraviolet emission from laser-produced Sn plasmas

Y. Tao, H. Nishimura, T. Okuno, S. Fujioka, N. Ueda, M. Nakai, K. Nagai, T. Norimatsu, N. Miyanaga, K. Nishihara, and Y. Izawa

Appl. Phys. Lett. 87, 241502 (2005); http://dx.doi.org/10.1063/1.2139990 (3 pages) | Cited 11 times

Online Publication Date: 7 December 2005

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Temporally resolved imaging of 13.5 nm extreme ultraviolet (EUV) emission from laser-produced Sn plasmas was experimentally investigated with a monochromatic EUV imager. Absorption caused by the surrounding plasma was eliminated by adopting a stripe Sn target laminated on a plastic film so that the CH plasma tamped lateral expansion of the Sn plasma. The experimental results revealed that reabsorption induced by plasma, both in EUV emission-dominant and long scale coronal regions, plays an key role in extracting the EUV light from the plasma efficiently.
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52.70.Kz Optical (ultraviolet, visible, infrared) measurements
52.25.Os Emission, absorption, and scattering of electromagnetic radiation
52.80.Hc Glow; corona
52.25.Fi Transport properties

Properties of ion debris emitted from laser-produced mass-limited tin plasmas for extreme ultraviolet light source applications

Shinsuke Fujioka, Hiroaki Nishimura, Katsunobu Nishihara, Masakatsu Murakami, Youngces-G Kang, Qincui Gu, Keiji Nagai, Takayoshi Norimatsu, Noriaki Miyanaga, Yasukazu Izawa, Kunioki Mima, Yoshinori Shimada, Atsushi Sunahara, and Hiroyuki Furukawa

Appl. Phys. Lett. 87, 241503 (2005); http://dx.doi.org/10.1063/1.2142102 (3 pages) | Cited 32 times

Online Publication Date: 8 December 2005

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Properties of ion debris emitted from laser-produced mass-limited tin plasmas have been experimentally investigated for an application to extreme ultraviolet (EUV) lithography. Simple scaling laws to design the mass-limited target, which is a key technique to minimize contamination of the first EUV collection mirror, is discussed. The measured energy spectrum of the tin ions is consistent with a prediction by the isothermal expansion model. The average charge state of the tin ions is evaluated to be +5 at 180 mm away from the plasma, and higher-energy ions have higher charge state. It was found that not only EUV emission but also ion energy spectra are sensitively affected by the target mass limitation.
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52.25.Os Emission, absorption, and scattering of electromagnetic radiation
52.50.Jm Plasma production and heating by laser beams (laser-foil, laser-cluster, etc.)
52.70.Kz Optical (ultraviolet, visible, infrared) measurements

Growth of highly oriented HfO2 thin films of monoclinic phase on yttrium-stabilized ZrO2 and Si substrates by pulsed-laser deposition

S. Dhar, M. S. Ramachandra Rao, S. B. Ogale, Darshan C. Kundaliya, S. R. Shinde, T. Venkatesan, S. J. Welz, R. Erni, and N. D. Browning

Appl. Phys. Lett. 87, 241504 (2005); http://dx.doi.org/10.1063/1.2142088 (3 pages) | Cited 6 times

Online Publication Date: 9 December 2005

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We report on the growth of highly oriented HfO2 thin films of monoclinic phase stabilized by 5% Co doping on (001) yttrium-stabilized zirconia (YSZ) using pulsed-laser deposition at 700 °C at an oxygen partial pressure of 10−4 Torr. On the other hand, pure HfO2 of such quality did not grow on YSZ in wide range of growth parameters. Rutherford backscattering-ion channeling in this film showed a 24% minimum yield (χmin) indicating highly oriented film growth, while hardly any ion channeling was observed in the undoped sample. High-resolution transmission electron microscopy revealed a sharp interface, and no signature of Co clusters. Electron energy loss spectroscopy showed that Co is in the 2+ state. Attempts were also made to grow films on a (001) Si substrate, and the results showed a very low ion channeling yield (∼8%).
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77.55.-g Dielectric thin films
68.55.A- Nucleation and growth
68.55.-a Thin film structure and morphology
68.55.Ln Defects and impurities: doping, implantation, distribution, concentration, etc.
81.15.Fg Pulsed laser ablation deposition
61.72.up Other materials
82.80.Ej X-ray, Mössbauer, and other γ-ray spectroscopic analysis methods
61.85.+p Channeling phenomena (blocking, energy loss, etc.)
68.49.Sf Ion scattering from surfaces (charge transfer, sputtering, SIMS)
82.80.Yc Rutherford backscattering (RBS), and other methods of chemical analysis
68.37.Lp Transmission electron microscopy (TEM)
79.20.Uv Electron energy loss spectroscopy
68.49.Jk Electron scattering from surfaces

Verification of a plasma photonic crystal for microwaves of millimeter wavelength range using two-dimensional array of columnar microplasmas

Osamu Sakai, Takui Sakaguchi, and Kunihide Tachibana

Appl. Phys. Lett. 87, 241505 (2005); http://dx.doi.org/10.1063/1.2147709 (3 pages) | Cited 40 times

Online Publication Date: 9 December 2005

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We experimentally verified that a microplasma assembly can create a functional dielectric layer for the propagation of electromagnetic waves as a “plasma photonic crystal.” A two-dimensional array in a square lattice was composed of columnar plasmas of about 2 mm in diameter, and the transmitted microwaves at 70–75 GHz showed a change of energy flow direction. This result is attributed to the fact that periodical structure is composed of individual plasma columns with a different dispersion than the ambient part and the experimental frequency range lies in the vicinity of the lowest band gap of the photonic crystal calculated theoretically.
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42.70.Qs Photonic bandgap materials
52.75.-d Plasma devices
52.40.Db Electromagnetic (nonlaser) radiation interactions with plasma
84.40.-x Radiowave and microwave (including millimeter wave) technology

Time-delayed, time-resolved Langmuir probe diagnostics of pulsed plasmas

Shu Qin and Allen McTeer

Appl. Phys. Lett. 87, 241506 (2005); http://dx.doi.org/10.1063/1.2146209 (3 pages)

Online Publication Date: 9 December 2005

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A method called time-delayed, time-resolved Langmuir probe measurement is used to measure pulsed plasmas to overcome the secondary electron emission during high-voltage pulses. The plasma densities of the pulsed-mode plasma or any plasmas with secondary electron issues can be measured and analyzed by using this method.
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52.70.Ds Electric and magnetic measurements
52.25.Tx Emission, absorption, and scattering of particles
52.40.Hf Plasma-material interactions; boundary layer effects
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