APL Nameplate
  • Volume/Page
  • Keyword
  • DOI
  • Citation
  • Advanced
   
 
 
 

Flickr Twitter iResearch App Facebook

BROWSE VOLUMES

Year Range: 
Search Issue | RSS Feeds RSS
Previous Issue Next Issue

30 Jan 2006

Volume 88, Issue 5, Articles (05xxxx)

Issue Cover Spotlight Figure

Appl. Phys. Lett. 88, 051101 (2006); http://dx.doi.org/10.1063/1.2168491 (3 pages)

H. Lohmeyer, K. Sebald, C. Kruse, R. Kröger, J. Gutowski, D. Hommel, J. Wiersig, N. Baer, and F. Jahnke
Enlarge Image | Read More
Return to All Sections
back to top
RSS Feeds

Time-resolved measurements of Cl2 density in high-density plasmas and application

Gilles Cunge, Masahito Mori, Martin Kogelschatz, and Nader Sadeghi

Appl. Phys. Lett. 88, 051501 (2006); http://dx.doi.org/10.1063/1.2171768 (3 pages) | Cited 13 times

Online Publication Date: 3 February 2006

Full Text: Read Online (HTML) | Download PDF

Show Abstract
Absorption at 355 nm, with a pulsed frequency tripled yttrium-aluminum-garnet laser as light source, is used to monitor the time evolution of the Cl2 density in high-density inductively coupled plasmas. The detection limit over a 0.1 s acquisition time is about 0.2 mTorr of Cl2. This technique is well suited for monitoring chlorine density when studying elementary processes in Cl2 containing plasmas. Furthermore, it can be applied to control the process drift in industrial etch reactors resulting from the modification of the chamber walls conditions: by measuring the Cl2 density in a reference Cl2 plasma before etching a wafer, it can be determined if the chamber wall conditions are kept identical from one wafer to another.
Show PACS
52.70.Kz Optical (ultraviolet, visible, infrared) measurements
52.25.-b Plasma properties
52.38.Dx Laser light absorption in plasmas (collisional, parametric, etc.)
52.77.Bn Etching and cleaning
52.40.Hf Plasma-material interactions; boundary layer effects
Return to All Sections
Close

Google Calendar

ADVERTISEMENT

Go to AIP Home   © AIP Publishing LLC
close