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9 Oct 2006

Volume 89, Issue 15, Articles (15xxxx)

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Appl. Phys. Lett. 89, 151920 (2006); http://dx.doi.org/10.1063/1.2360906 (3 pages)

Aycan Yurtsever, Matthew Weyland, and David A. Muller
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Method to assess the grain crystallographic orientation with a submicronic spatial resolution using Kelvin probe force microscope

Nicolas Gaillard, Mickael Gros-Jean, Denis Mariolle, François Bertin, and Ahmad Bsiesy

Appl. Phys. Lett. 89, 154101 (2006); http://dx.doi.org/10.1063/1.2359297 (3 pages) | Cited 12 times

Online Publication Date: 10 October 2006

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In thin polycrystalline copper film, a direct correlation between the grain crystallographic orientation and the work function has been evidenced by comparing Kelvin probe force microscope (KFM) mapping and electron backscattered diffraction analysis performed over the same region. As a result, work function mapping provided by KFM technique can be used to assess the crystallographic properties of thin layers with a spatial resolution better than 100 nm.
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68.55.-a Thin film structure and morphology
73.61.At Metal and metallic alloys
73.30.+y Surface double layers, Schottky barriers, and work functions
68.37.Ps Atomic force microscopy (AFM)
79.20.Kz Other electron-impact emission phenomena

Why are metal foams stable?

Astrid Haibel, Alexander Rack, and John Banhart

Appl. Phys. Lett. 89, 154102 (2006); http://dx.doi.org/10.1063/1.2357931 (3 pages) | Cited 12 times

Online Publication Date: 10 October 2006

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Although metal foams are becoming accepted engineering materials, the reason for their stability in the liquid state is still under dispute. Liquid metal foams contain solid constituents which according to the existing models stabilize foam films by either modifying the curvature of the liquid/gas (L/G) interfaces, or by forming particle bridges across metallic films and transmitting repulsive “disjoining” forces mechanically. Using high-resolution synchrotron tomography and a quantitative three-dimensional image analysis the authors show that there is little evidence for such curvature changes or particle bridges. The authors conclude that the main stabilizing action must be due to interactions between neighboring particles attached to L/G interfaces.
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82.70.Rr Aerosols and foams
68.55.-a Thin film structure and morphology

X-ray photoelectron spectroscopy study of dielectric constant for Si compounds

K. Hirose, M. Kihara, D. Kobayashi, H. Okamoto, S. Shinagawa, H. Nohira, E. Ikenaga, M. Higuchi, A. Teramoto, S. Sugawa, T. Ohmi, and T. Hattori

Appl. Phys. Lett. 89, 154103 (2006); http://dx.doi.org/10.1063/1.2361177 (3 pages) | Cited 3 times

Online Publication Date: 11 October 2006

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The authors measure the difference of core-level binding energy shifts for Si 1s and Si 2p, ΔE1s-ΔE2p, for various Si compounds using high-resolution high-energy synchrotron radiation. They find that the ΔE1s-ΔE2p values are in very good correlation with the dielectric constant values of the Si compounds. Using this relation, they deduce the local dielectric constant for each of the Si intermediate oxidation states formed at the SiO2/Si interface. The results are in good agreement with values predicted by a first-principles calculation.
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77.22.Ch Permittivity (dielectric function)
79.60.Jv Interfaces; heterostructures; nanostructures
73.20.At Surface states, band structure, electron density of states

On the deposition rate in a high power pulsed magnetron sputtering discharge

J. Alami, K. Sarakinos, G. Mark, and M. Wuttig

Appl. Phys. Lett. 89, 154104 (2006); http://dx.doi.org/10.1063/1.2362575 (3 pages) | Cited 36 times

Online Publication Date: 13 October 2006

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The effect of the high pulse current and the duty cycle on the deposition rate in high power pulsed magnetron sputtering (HPPMS) is investigated. Using a Cr target and the same average target current, deposition rates are compared to dc magnetron sputtering (dcMS) rates. It is found that for a peak target current density ITpd of up to 570 mA cm−2, HPPMS and dcMS deposition rates are equal. For ITpd>570 mA cm−2, optical emission spectroscopy shows a pronounced increase of the Cr+/Cr0 signal ratio. In addition, a loss of deposition rate, which is attributed to self-sputtering, is observed.
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81.15.Cd Deposition by sputtering
81.15.Jj Ion and electron beam-assisted deposition; ion plating
52.77.Dq Plasma-based ion implantation and deposition
68.55.A- Nucleation and growth
68.37.Xy Scanning Auger microscopy, photoelectron microscopy
52.70.Kz Optical (ultraviolet, visible, infrared) measurements

Pressure-driven devices with lithographically fabricated composite epoxy-elastomer membranes

Kyle Campbell, Uriel Levy, Yeshaiahu Fainman, and Alex Groisman

Appl. Phys. Lett. 89, 154105 (2006); http://dx.doi.org/10.1063/1.2361169 (3 pages) | Cited 2 times

Online Publication Date: 13 October 2006

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The authors describe the fabrication and applications of composite membranes with lithographically defined pieces of rigid UV-cured epoxy grafted inside a flexible polydimethylsiloxane membrane. The pattern of epoxy in the membrane defines its mode of deformation under pressure. They constructed and characterized two devices with the composite membranes. In one device, the grafted pieces of epoxy focus the pressure-induced membrane extension to a thin strip, and in the other device, the epoxy pattern generates in-plane rotation of the membrane under pressure. The proposed composite membranes can be used in pressure-driven actuators and adaptive optical devices.
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85.85.+j Micro- and nano-electromechanical systems (MEMS/NEMS) and devices
07.10.Cm Micromechanical devices and systems
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