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Applied Physics Letters / Volume 89 / Issue 3 / STRUCTURAL, MECHANICAL, THERMODYNAMIC, AND OPTICAL PROPERTIES OF CONDENSED MATTER

Appl. Phys. Lett. 89, 031915 (2006); http://dx.doi.org/10.1063/1.2221912 (3 pages)

Ca test of Al2O3 gas diffusion barriers grown by atomic layer deposition on polymers

P. F. Carcia1, R. S. McLean1, M. H. Reilly1, M. D. Groner2, and S. M. George3

1DuPont Research and Development, Experimental Station, Wilmington, Delaware 19880-0356
2Department of Chemistry and Biochemistry, University of Colorado, Boulder, Colorado 80309
3Department of Chemistry and Biochemistry, University of Colorado, Boulder, Colorado 80309 and Department of Chemical and Biological Engineering, University of Colorado, Boulder, Colorado 80309

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(Received 6 March 2006; accepted 25 May 2006; published online 19 July 2006)

Quantitative Ca tests were used to determine the water vapor transmission rate (WVTR) through 25 nm thick Al2O3 gas diffusion barriers grown on plastic by atomic layer deposition (ALD). The measured WVTRs were 1.7×10−5 g/m2 day at 38 °C and 6.5×10−5 g/m2 day at 60 °C. Based on the apparent activation energy, the WVTR at 23 °C is estimated to be only 6×10−6 g/m2 day. The WVTR values for the Al2O3 ALD film are very similar to the WVTR value for the glass control. These Ca tests indicate that Al2O3 ALD gas diffusion barriers should enable display and lighting applications of highly moisture sensitive organic light-emitting diodes on plastic.

© 2006 American Institute of Physics

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KEYWORDS and PACS

Keywords

alumina, calcium, metallic thin films, diffusion, atomic layer deposition

PACS

  • 81.05.Bx

    Metals, semimetals, and alloys

  • 81.15.-z

    Methods of deposition of films and coatings; film growth and epitaxy

  • 68.55.A-

    Nucleation and growth

ARTICLE DATA

Digital Object Identifier
http://dx.doi.org/10.1063/1.2221912

PUBLICATION DATA

ISSN

0003-6951 (print)  
1077-3118 (online)

Publisher

$abstract.society.value is a Member of CrossRef American Institute of Physics

For access to fully linked references, you need to log in.
    C. W. Tang and S. A. Van Slyke, Appl. Phys. Lett. 51, 913 (1987)APPLAB000051000012000913000001.

    G. L. Graff, R. E. Williford, and P. E. Burrows, J. Appl. Phys. 96, 1840 (2004)JAPIAU000096000004001840000001.

    G. Rossi and M. Nulman, J. Appl. Phys. 74, 5471 (1993)JAPIAU000074000009005471000001.

    M. D. Groner, S. M. George, R. S. McLean, and P. F. Carcia, Appl. Phys. Lett. 88, 051907 (2006)APPLAB000088000005051907000001.

    A. P. Ghosh, L. J. Gerenser, C. M. Jarman, and J. E. Fornalik, Appl. Phys. Lett. 86, 223503 (2005)APPLAB000086000022223503000001.


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