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17 Jul 2006

Volume 89, Issue 3, Articles (03xxxx)

Issue Cover Spotlight Figure

Appl. Phys. Lett. 89, 031107 (2006); http://dx.doi.org/10.1063/1.2222329 (3 pages)

Jiaguang Han, Zhiyuan Zhu, Sanith Ray, Abul K. Azad, Weili Zhang, Mingxia He, Shihong Li, and Yiping Zhao
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Simultaneous control of numerical enhancement of N atoms and decrease in heat flux into reaction chamber using Ar–N2 pulse-modulated induction thermal plasmas

Yasunori Tanaka, Takafumi Muroya, Kouhei Hayashi, and Yoshihiko Uesugi

Appl. Phys. Lett. 89, 031501 (2006); http://dx.doi.org/10.1063/1.2226994 (3 pages) | Cited 11 times

Online Publication Date: 17 July 2006

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A numerical enhancement of nitrogen atoms and a simultaneous decrease in heat flux flowing into the reaction chamber were found using a high-power Ar–N2 pulse-modulated induction thermal plasma. Optical emission spectroscopy was carried out to estimate the relative number of excited nitrogen atoms flowing into the reaction chamber. The relative heat flux into the reaction chamber was evaluated from surface temperature measurement of a metal specimen installed at the downstream portion of the plasma torch. Results showed that decreasing the shimmer current level, which means the modulation degree of the coil current, increases the number of excited nitrogen atoms, while the heat flux can be reduced compared to a conventional steady state induction thermal plasma.
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52.50.Dg Plasma sources
52.25.Fi Transport properties
52.25.Kn Thermodynamics of plasmas
52.70.Kz Optical (ultraviolet, visible, infrared) measurements
52.75.Hn Plasma torches

Linear arrays of ceramic microcavity plasma devices (127–180 μm diameter) driven by buried coplanar electrodes: Shaping the intracavity electric field and emission profile

S.-J. Park, T. M. Spinka, and J. G. Eden

Appl. Phys. Lett. 89, 031502 (2006); http://dx.doi.org/10.1063/1.2218307 (3 pages) | Cited 5 times

Online Publication Date: 18 July 2006

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Shaping the electric field within a microcavity plasma device can be accomplished by the introduction of curvature into the dielectric-plasma interface when the microcavity is inserted between coplanar electrodes. To that end, linear arrays of cylindrical microcavity plasma devices with diameters of 127 or 180 μm have been fabricated in low temperature cofired ceramic(εr = 40) and operated in the rare gases at pressures in the 400–800 Torr range. Comprising 72 microcavities, each linear array is powered by two buried Ag electrodes lying parallel to the array and driven by either a sinusoidal ac or bipolar pulsed dc waveform. Examination of Ne microplasmas with an optical telescope reveals the existence of pressure-dependent structure on the spatially resolved emission profiles. Strongest emission is observed from two negative glows on opposite sides of the microcavity. Confined to regions of low electric field strength and a weak gradient, the negative glows generate maximum intensity 25–35 μm from the wall of a 180 μm diameter microcavity. A central peak appears along the longitudinal axis of symmetry of the microcavity for pNe≳700 Torr, reflecting the formation of a positive column. Operating voltages as low as 190 V rms have been measured for excitation of a linear array of 180 μm diameter devices operating at a Ne pressure of 400–700 Torr and driven by a 20 kHz voltage waveform.
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52.75.-d Plasma devices
07.10.Cm Micromechanical devices and systems
52.50.Dg Plasma sources
52.70.Kz Optical (ultraviolet, visible, infrared) measurements
52.25.Os Emission, absorption, and scattering of electromagnetic radiation
52.80.Hc Glow; corona

Potential of discharge-based lithium plasma as an extreme ultraviolet source

Majid Masnavi, Mitsuo Nakajima, Akira Sasaki, Eiki Hotta, and Kazuhiko Horioka

Appl. Phys. Lett. 89, 031503 (2006); http://dx.doi.org/10.1063/1.2227560 (3 pages) | Cited 9 times

Online Publication Date: 19 July 2006

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Extreme ultraviolet (EUV) discharge-based lamps for EUV lithography need to generate extremely high power in the spectrum band of 13.5±0.135 nm. A model was developed to investigate the wavelength-integrated Lyman-α lines light outputs in hydrogen-like lithium ion. The analysis reveals that the commonly observed low conversion efficiency is largely due to a transient nature of Z discharge-based plasma and that a magnetically confined lithium plasma is an efficient EUV source even at low electron temperature. Calculation shows necessary confinement time that raises the conversion efficiency up to half the spectral efficiency.
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52.77.-j Plasma applications
52.80.Yr Discharges for spectral sources (including inductively coupled plasma)
52.50.Dg Plasma sources
52.25.Os Emission, absorption, and scattering of electromagnetic radiation
52.55.Dy General theory and basic studies of plasma lifetime, particle and heat loss, energy balance, field structure, etc.
85.40.Hp Lithography, masks and pattern transfer

Local discharge and distribution of wall charge in coplanar dielectric barrier discharge

Jiting Ouyang, Feng He, Shuo Feng, Zhinong Yu, Zhihu Liang, and Jianqi Wang

Appl. Phys. Lett. 89, 031504 (2006); http://dx.doi.org/10.1063/1.2227721 (3 pages) | Cited 4 times

Online Publication Date: 20 July 2006

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The local discharge and wall charge distribution on dielectric surface in coplanar dielectric barrier discharge have been studied experimentally by employing a segment-electrode system. The results show that the local discharge currents on the segment electrodes are different when the segments act as cathode and/or anode, but the charge transfers during the current pulses are symmetric on the correlative parts of the electrodes. The wall charge distribution and the wall voltage during afterglow are uniform on the dielectric layer above the segments near the coplanar gap, while they decrease outwards in the outer side of the electrode if the voltage supply is not high enough. The segment-electrode configuration provides a possible way to investigate the local processes of the discharge in dielectric barrier discharge.
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52.80.Hc Glow; corona
52.40.Hf Plasma-material interactions; boundary layer effects
52.70.Ds Electric and magnetic measurements
52.25.Fi Transport properties
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