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14 Aug 2006

Volume 89, Issue 7, Articles (07xxxx)

Issue Cover Spotlight Figure

Appl. Phys. Lett. 89, 073501 (2006); http://dx.doi.org/10.1063/1.2335838 (3 pages)

Ingrid Graz, Martin Kaltenbrunner, Christoph Keplinger, Reinhard Schwödiauer, Siegfried Bauer, Stéphanie P. Lacour, and Sigurd Wagner
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Silicon surface periodic structures produced by plasma flow induced capillary waves

I. P. Dojčinović, M. M. Kuraica, B. M. Obradović, and J. Purić

Appl. Phys. Lett. 89, 071501 (2006); http://dx.doi.org/10.1063/1.2336617 (3 pages) | Cited 5 times

Online Publication Date: 14 August 2006

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Silicon single crystal surface modification by the action of nitrogen quasistationary compression plasma flow generated by a magnetoplasma compressor is studied. It has been found that highly oriented silicon periodic cylindrical shape structures are produced during a single pulse surface treatment. The periodical structure formation can be related to the driven capillary waves quenched during fast cooling and resolidification phase of the plasma flow interaction with silicon surface. These waves are induced on the liquid silicon surface due to the compression plasma flow intrinsic oscillations.
Show PACS
52.77.Fv High-pressure, high-current plasmas (plasma spray, arc welding, etc.)
81.05.Cy Elemental semiconductors
52.30.Cv Magnetohydrodynamics (including electron magnetohydrodynamics)
52.40.Hf Plasma-material interactions; boundary layer effects
81.30.Fb Solidification
64.70.D- Solid-liquid transitions
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