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9 Jul 2007

Volume 91, Issue 2, Articles (02xxxx)

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Appl. Phys. Lett. 91, 023101 (2007); http://dx.doi.org/10.1063/1.2755879 (3 pages)

M. Fendrich and T. Kunstmann
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Nonlithographic fabrication of surface-enhanced Raman scattering substrates using a rastered atmospheric-pressure microplasma source

Wei-Hung Chiang, Matthew Cochey, R. Craig Virnelson, and R. Mohan Sankaran

Appl. Phys. Lett. 91, 021501 (2007); http://dx.doi.org/10.1063/1.2757152 (3 pages) | Cited 10 times

Online Publication Date: 13 July 2007

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A nonlithographic patterning technique based on a numerically controlled atmospheric-pressure microplasma source has been developed to fabricate surface-enhanced Raman scattering (SERS) substrates. Microstructures in silver (Ag) films on glass are created by localized physical sputtering of Ag atoms using an argon (Ar) microplasma horizontally scanned across the glass substrate. Detection of crystal violet on patterned substrates shows an enhancement of the Raman scattering signal intensity by eight to ten orders of magnitude higher than bare Ag/glass substrates. The SERS enhancement depends on the pattern geometry showing that the mechanism is related to surface irregularities in the sputtered holes.
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78.35.+c Brillouin and Rayleigh scattering; other light scattering
52.77.-j Plasma applications
68.55.-a Thin film structure and morphology
68.47.Gh Oxide surfaces
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