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Appl. Phys. Lett. 91, 061923 (2007); http://dx.doi.org/10.1063/1.2768915 (3 pages)
Plasma ehnancement of metalorganic chemical vapor deposition and properties of Er2O3 nanostructured thin films
(Received 17 May 2007; accepted 16 July 2007; published online 10 August 2007)
© 2007 American Institute of Physics
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