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28 Apr 2008

Volume 92, Issue 17, Articles (17xxxx)

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Appl. Phys. Lett. 92, 173301 (2008); http://dx.doi.org/10.1063/1.2912822 (3 pages)

Takeo Minari, Masataka Kano, Tetsuhiko Miyadera, Sui-Dong Wang, Yoshinobu Aoyagi, Mari Seto, Takashi Nemoto, Seiji Isoda, and Kazuhito Tsukagoshi
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Production of high-density capacitive plasma by the effects of multihollow cathode discharge and high-secondary-electron emission

Y. Ohtsu and H. Fujita

Appl. Phys. Lett. 92, 171501 (2008); http://dx.doi.org/10.1063/1.2917795 (3 pages) | Cited 7 times

Online Publication Date: 28 April 2008

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High-density capacitively coupled plasma with electron density of 1011 cm−3 was produced with the effects of the multihollow cathode discharge and the high-secondary-electron emission from radio frequency (rf)-biased electrode using Ar gas. It was found that the optimum pressure was around 3–15 Pa. In the case of only multihollow cathode discharge, the plasma density increased from 1.2×1010 to 8×1010 cm−3 with the increasing distance z from the cathode electrode for 5 mm<z<15 mm. Moreover, plasma density increased with increasing voltage of rf-biased electrode. The rate of deposited amorphous hydrocarbon thin films of about 200 nm/min was attained with the high-density rf plasma enhanced chemical vapor deposition using CH4 gas.
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52.50.Dg Plasma sources
52.80.Hc Glow; corona
52.77.Dq Plasma-based ion implantation and deposition
52.25.-b Plasma properties
81.15.Gh Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.)
68.55.A- Nucleation and growth

Generation of fast neutrals in a laser-blow-off of LiF–C film: A formation mechanism

R. K. Singh, Ajai Kumar, V. Prahlad, and H. C. Joshi

Appl. Phys. Lett. 92, 171502 (2008); http://dx.doi.org/10.1063/1.2906368 (3 pages) | Cited 7 times

Online Publication Date: 1 May 2008

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The temporal profiles of the spectral lines Li I and Li II emitted by a laser blow off of LiF–C film were analyzed. Fast neutrals having energies of ∼ 310 eV were observed. It was found that these fast neutrals have kinetic energies similar to that of the ablated ions. Photon production rates at 670.8 nm were estimated for the recombination and charge exchange processes. We attempted to qualitatively understand the role of electron-ion recombination (two and three body recombinations) and charge exchange processes in producing observed fast neutrals. Our analysis indicates that charge exchange is the dominant process in the production of fast neutrals.
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73.61.-r Electrical properties of specific thin films
73.50.Gr Charge carriers: generation, recombination, lifetime, trapping, mean free paths
82.30.Fi Ion-molecule, ion-ion, and charge-transfer reactions
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