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5 May 2008

Volume 92, Issue 18, Articles (18xxxx)

Issue Cover Spotlight Figure

Appl. Phys. Lett. 92, 182104 (2008); http://dx.doi.org/10.1063/1.2917705 (3 pages)

Jiang Chen, Yibin Hu, Ke Xia, and Zhongshui Ma
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Power scaling of an extreme ultraviolet light source for future lithography

Erik Wagenaars, Felix Küpper, Jürgen Klein, Willi Neff, Marcel Damen, Pieter van der Wel, Dominik Vaudrevange, and Jeroen Jonkers

Appl. Phys. Lett. 92, 181501 (2008); http://dx.doi.org/10.1063/1.2924299 (3 pages) | Cited 2 times

Online Publication Date: 8 May 2008

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For future lithography applications, high-power extreme ultraviolet (EUV) light sources are needed at a central wavelength of 13.5 nm within 2% bandwidth. We have demonstrated that from a physics point of view the Philips alpha-prototype source concept is scalable up to the power levels required for high-volume manufacturing (HVM) purposes. Scalability is shown both in frequency, up to 100 kHz, and pulse energy, up to 55 mJ collectable EUV per pulse, which allows us to find an optimal working point for future HVM sources within a wide parameter space.
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42.72.Bj Visible and ultraviolet sources
42.82.Cr Fabrication techniques; lithography, pattern transfer

Dynamic voltage-current characteristics for a water jet plasma arc

Jiaxiang Yang, Sheng Lan, and Zuoming Xu

Appl. Phys. Lett. 92, 181502 (2008); http://dx.doi.org/10.1063/1.2927475 (3 pages)

Online Publication Date: 8 May 2008

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A virtual instrument technology is used to measure arc current, arc voltage, dynamic V-I characteristics, and nonlinear conductance for a cone-shaped water jet plasma arc under ac voltage. Experimental results show that ac arc discharge mainly happens in water vapor evaporated from water when heated. However, due to water’s cooling effect and its conductance, arc conductance, reignition voltage, extinguish voltage, and current zero time are very different from those for ac arc discharge in gas work fluid. These can be valuable to further studies on mechanism and characteristics of plasma ac discharge in water, and even in gas work fluid.
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52.80.Mg Arcs; sparks; lightning; atmospheric electricity
52.25.Fi Transport properties
52.70.Ds Electric and magnetic measurements
52.75.Hn Plasma torches

Deposited debris characteristics and its reduction of a laser-produced plasma extreme ultraviolet source using a colloidal tin dioxide jet target

Masanori Kaku, Sumihiro Suetake, Yusuke Senba, Shoichi Kubodera, Masahito Katto, and Takeshi Higashiguchi

Appl. Phys. Lett. 92, 181503 (2008); http://dx.doi.org/10.1063/1.2924302 (3 pages) | Cited 3 times

Online Publication Date: 9 May 2008

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Debris characteristics and their reduction have been investigated for a laser-produced plasma extreme ultraviolet source by using a colloidal jet target containing tin dioxide nanoparticles. The amounts of deposited debris on a witness plate were determined by total laser energy irradiated onto a target. In situ low-temperature (100 °C) heating of a plate was effective to reduce the amounts of deposited debris, since colloidal debris was easily vaporized by the heat.
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52.50.Jm Plasma production and heating by laser beams (laser-foil, laser-cluster, etc.)
52.50.Dg Plasma sources
52.70.-m Plasma diagnostic techniques and instrumentation
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