• Volume/Page
  • Keyword
  • DOI
  • Citation
  • Advanced
   
 
 
 

Flickr Twitter iResearch App

You are not logged in Access to this article requires a subscription or AIP Article Pack, or rent it for . Log In

Applied Physics Letters / Browse Journal / Volume 92 / Issue 2 / PLASMAS AND ELECTRICAL DISCHARGES

Appl. Phys. Lett. 92, 021503 (2008); doi:10.1063/1.2827579 (3 pages)

Pinch current limitation effect in plasma focus

S. Lee1 and S. H. Saw2

1Nanyang Technological University, National Institute of Education, Singapore 637616 and INTI International University College, 71800 Nilai, Malaysia Map This map
2INTI International University College, 71800 Nilai, Malaysia Map This map

(Received 8 November 2007; accepted 3 December 2007; published online 17 January 2008)

The Lee model couples the electrical circuit with plasma focus dynamics, thermodynamics, and radiation. It is used to design and simulate experiments. A beam-target mechanism is incorporated, resulting in realistic neutron yield scaling with pinch current and increasing its versatility for investigating all Mather-type machines. Recent runs indicate a previously unsuspected “pinch current limitation” effect. The pinch current does not increase beyond a certain value however low the static inductance is reduced to. The results indicate that decreasing the present static inductance of the PF1000 machine will neither increase the pinch current nor the neutron yield, contrary to expectations.

© 2008 American Institute of Physics

EDITORIALLY RELATED

    Related Articles

  1. Comments on “Pinch current limitation effect in plasma focus” [Appl. Phys. Lett. 92, 021503 (2008)]
    H. Bruzzone et al.
    Appl. Phys. Lett. 94, 076101 (2009)APPLAB000094000007076101000001
  2. Response to “Comment on `Pinch current limitation effect in plasma focus'” [Appl. Phys. Lett. 94, 076101 (2009)]
    S. Lee et al.
    Appl. Phys. Lett. 94, 076102 (2009)APPLAB000094000007076102000001

RELATED DATABASES

To view database links for this article, you need to log in.

KEYWORDS and PACS

Keywords

pinch effect, plasma focus

PACS

  • 52.58.Lq

    Z-pinches, plasma focus, and other pinch devices

ARTICLE DATA

Permalink
http://link.aip.org/link/APPLAB/v92/i2/p021503/s1

PUBLICATION DATA

ISSN:

0003-6951 (print)  
1077-3118 (online)

Publisher:

$abstract.society.value is a Member of CrossRef American Institute of Physics

For access to fully linked references, you need to log in.
  1. S. Lee in Laser and Plasma Technology, edited by S. Lee, B. C. Tan, C. S. Wong, and A. C. Chew (World Scientific, Singapore, 1985), pp. 387–420.
  2. S. Lee, T. Y. Tou, S. P. Moo, M. A. Elissa, A. V. Gholap, K. H. Kwek, S. Mulyodrono, A. J. Smith, Suryadi, W. Usala, and M. Zakaullah, Am. J. Phys. 56, 62 (1988).
  3. T. Y. Tou, S. Lee, and K. H. Kwek, IEEE Trans. Plasma Sci. 17, 311 (1989).
  4. S. Lee and A. Serban, IEEE Trans. Plasma Sci. 24, 1101 (1996).
  5. D. E. Potter, Phys. Fluids 14, 1911 (1971)PFLDAS000014000009001911000001.
  6. M. H. Liu, X. P. Feng, S. V. Springham, and S. Lee, IEEE Trans. Plasma Sci. 26, 135 (1998).
  7. S. Lee, P. Lee, G. Zhang, X. Feng, V. A. Gribkov, M. Liu, A. Serban, and T. Wong, IEEE Trans. Plasma Sci. 26, 1119 (1998).
  8. S. Bing, “Plasma dynamics and x-ray emission of the plasma focus,” Ph.D. thesis, NIE, 2000 (in ICTP Open Access Archive: http://eprints.ictp.it/99/)
  9. S. Lee, in http://ckplee.myplace.nie.edu.sg/plasmaphysics/ (2000 and 2007).
  10. S. Lee in ICTP Open Access Archive: http://eprints.ictp.it/85/ (2005).
  11. V. Siahpoush, M. A. Tafreshi, S. Sobhanian, and S. Khorram, Plasma Phys. Controlled Fusion 47, 1065 (2005).
  12. S. Lee, Twelve Years of UNU/ICTP PFF-A Review (1998) IC, 98 (231)
    A. Salam ICTP, Miramare, Trieste (in ICTP OAA: http://eprints.ictp.it/31/).
  13. L. Soto, P. Silva, J. Moreno, G. Silvester, M. Zambra, C. Pavez, L. Altamirano, H. Bruzzone, M. Barbaglia, Y. Sidelnikov, and W. Kies, Braz. J. Phys. 34, 1814 (2004).
  14. H. Acuna, F. Castillo, J. Herrera, and A. Postal, International Conference on Plasma Sci, 3–5 June 1996 (unpublished), p. 127.
  15. C. Moreno, V. Raspa, L. Sigaut, and R. Vieytes, Appl. Phys. Lett. 89, 15 (2006).
  16. D. Wong, P. Lee, T. Zhang, A. Patran, T. L. Tan, R. S. Rawat, and S. Lee, Plasma Sources Sci. Technol. 16, 116 (2007).
  17. V. A. Gribkov, A. Banaszak, B. Bienkowska, A. V. Dubrovsky, I. Ivanova-Stanik, L. Jakubowski, L. Karpinski, R. A. Miklaszewski, M. Paduch, M. J. Sadowski, M. Scholz, A. Szydlowski, and K. Tomaszewski, J. Phys. D 40, 3592 (2007).
  18. J. D. Huba, 2006 Plasma Formulary, p. 44. http://wwwppd.nrl.navy.mil/nrlformulary/NRL_FORMULARY_07.pdf
  19. S. V. Springham, S. Lee, and M. S. Rafique, Plasma Phys. Controlled Fusion 42, 1023 (2000).
  20. W. Kies, in Laser and Plasma Technology, Proceedings of Second Tropical College, edited by S. Lee, B. C. Tan, C. S. Wong, A. C. Chew, K. S. Low, H. Ahmad, and Y. H. Chen (World Scientific, Singapore, 1988), pp. 86–137.
  21. H. Herold, in Laser and Plasma Technology, Proceedings of Third Tropical College, edited by C. S. Wong, S. Lee, B. C. Tan, A. C. Chew, K. S. Low, and S. P. Moo (World Scientific, Singapore, 1990), pp. 21–45.
  22. A. Patran, R. S. Rawat, J. M. Koh, S. V. Springham, T. L. Tan, P. Lee, and S. Lee, 31st EPS Conference on Plasma Physics London, 2004 (unpublished), Vol. 286, p. 4.213.
  23. http://www.intimal.edu.my/school/fas/UFLF/

For access to citing articles, you need to log in.


Figures (1)

Access to article objects (figures, tables, multimedia) requires a subscription; log in to view available files.
(Access to supplementary material, where available, is free for this journal.)



Close

Google Calendar

ADVERTISEMENT

Your Recent History Recent History Help

Recently Viewed Articles

  1. Pinch current limitation effect in plasma focus
  2. Doping tunable resonance: Toward electrically tunable mid-infrared metamaterials
Go to AIP Home
Copyright © American Institute of Physics
close