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9 Jun 2008

Volume 92, Issue 23, Articles (23xxxx)

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Appl. Phys. Lett. 92, 231901 (2008); http://dx.doi.org/10.1063/1.2938921 (3 pages)

N. A. Mara, D. Bhattacharyya, P. Dickerson, R. G. Hoagland, and A. Misra
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Plasma actuated heat transfer

Subrata Roy and Chin-Cheng Wang

Appl. Phys. Lett. 92, 231501 (2008); http://dx.doi.org/10.1063/1.2938886 (3 pages)

Online Publication Date: 12 June 2008

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We introduce plasmas for film cooling enhancement in gas turbines and other engineering applications. We identify mechanisms to actuate essentially stagnant fluid just downstream of the cooling hole by employing three-dimensional body force for different hole geometries. Such methods actively alter flow structures in the vicinity of an actuator using an electrodynamic mechanism that induces attachment of cold jet to the work surface. Numerical results are compared with published experimental data and other numerical predictions for the latest film cooling technology. An effectiveness improvement of above 100% over the standard baseline design is predicted.
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52.75.-d Plasma devices
47.85.L- Flow control
07.07.Tw Servo and control equipment; robots
02.60.Cb Numerical simulation; solution of equations

Effect of electron energy distribution function on the global model for high power microwave breakdown at high pressures

Sang Ki Nam and John P. Verboncoeur

Appl. Phys. Lett. 92, 231502 (2008); http://dx.doi.org/10.1063/1.2942382 (3 pages) | Cited 16 times

Online Publication Date: 13 June 2008

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A global model (GM) was developed to investigate the effect of reaction kinetics and plasma parameters on high power microwave (HPM) breakdown time for multiple species. However, the GM requires specification of the electron energy distribution function (EEDF); the common assumption of a Maxwellian EEDF results in incorrect plasma parameters since the electrons are not in equilibrium. We examine the effect of the EEDF on the GM and develop a method to obtain a better EEDF to improve the fidelity of the prediction of HPM breakdown at high pressures.
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52.80.Pi High-frequency and RF discharges
82.33.Xj Plasma reactions (including flowing afterglow and electric discharges)
82.20.-w Chemical kinetics and dynamics

Angular emission and self-absorption studies of a tin laser produced plasma extreme ultraviolet source between 10 and 18 nm

O. Morris, F. O’Reilly, P. Dunne, and P. Hayden

Appl. Phys. Lett. 92, 231503 (2008); http://dx.doi.org/10.1063/1.2945645 (3 pages) | Cited 7 times

Online Publication Date: 13 June 2008

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Extreme ultraviolet spectra from a tin laser produced plasma have been recorded over a range of angles between 20° and 90° from the target normal. Absolute intensity measurements are presented of both the 2% band centered on 13.5 nm and the total radiation emitted by the plasma between 10 and 18 nm. The in-band intensity is seen to be relatively constant out to an angle of 60° from the target normal, beyond which it drops off quite steeply. The spectra at wavelengths greater than 13.5 nm are strongly influenced by self-absorption by ions ranging from 6+ to 10+.
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52.50.Jm Plasma production and heating by laser beams (laser-foil, laser-cluster, etc.)
52.25.Os Emission, absorption, and scattering of electromagnetic radiation
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