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11 Feb 2008

Volume 92, Issue 6, Articles (06xxxx)

Issue Cover Spotlight Figure

Appl. Phys. Lett. 92, 063101 (2008); http://dx.doi.org/10.1063/1.2839572 (3 pages)

M. N. Ou, T. J. Yang, S. R. Harutyunyan, Y. Y. Chen, C. D. Chen, and S. J. Lai
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Sheath and presheath in ion-ion plasmas via particle-in-cell simulation

A. Meige, G. Leray, J.-L. Raimbault, and P. Chabert

Appl. Phys. Lett. 92, 061501 (2008); http://dx.doi.org/10.1063/1.2838293 (3 pages) | Cited 7 times

Online Publication Date: 11 February 2008

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A full particle-in-cell simulation is developed to investigate electron-free plasmas constituted of positive and negative ions under the influence of a dc bias voltage. It is shown that high-voltage sheaths following the classical Child-law sheaths form within a few microseconds (which corresponds to the ion transit time) after the dc voltage is applied. It is also shown that there exists the equivalent of a Bohm criterion where a presheath accelerates the ions collected at one of the electrodes up to the sound speed before they enter the sheath. From an applied perspective, this leads to smaller sheaths than one would expect.
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52.40.Kh Plasma sheaths
52.65.Rr Particle-in-cell method

Improvement of the vacuum ultraviolet efficiency of low pressure Xe discharge by nitrogen admixture

Ki Wan Park, Hyeon Seok Hwang, Man Hyeop Han, Hong Koo Baik, and Kie Moon Song

Appl. Phys. Lett. 92, 061502 (2008); http://dx.doi.org/10.1063/1.2842408 (3 pages) | Cited 4 times

Online Publication Date: 13 February 2008

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We investigated XeN2 gas discharge primarily as a source of vacuum ultraviolet for florescent lamps. The discharge performances of Xe based nitrogen admixture gas are improved when compared with the results of pure Xe discharge. The experimental results come from investigating the Xe positive column and were determined by measuring the infrared radiation during the discharge operation. These results suggest that the integrated infrared area is increased by about 40% under optimal conditions. This efficiency increase occurs because low energy electrons contribute to the production of exited nitrogen, which can excite Xe gas.
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52.80.Yr Discharges for spectral sources (including inductively coupled plasma)
42.72.Bj Visible and ultraviolet sources

Formation of stable direct current microhollow cathode discharge by venturi gas flow system for remote plasma source in atmosphere

Ki Wan Park, Tae Il Lee, Hyeon Seok Hwang, Joo Hyon Noh, Hong Koo Baik, and Kie Moon Song

Appl. Phys. Lett. 92, 061503 (2008); http://dx.doi.org/10.1063/1.2842427 (3 pages) | Cited 2 times

Online Publication Date: 13 February 2008

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We introduce a microhollow cathode configuration with venturi gas flow to ambient air in order to obtain glow discharge at atmospheric pressure. Stable microhollow cathode discharge was formed in a 200 μm diameter at 9 mA and the optimum value of gas velocity×diameter for hollow cathode effect was obtained in our system. In order to confirm hollow cathode effect, we measured the enhancement of E/N strength for 200 μm (0.31 m2/s) and 500 μm (0.78 m2/s) air discharge at 8 mA under the velocity of 156 m/s. As a result, an increase of 46.7% in E/N strength of the discharge of 200 μm hole was obtained compare to that of 500 μm.
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52.80.Hc Glow; corona
52.50.Dg Plasma sources

Plasma power measurement and hysteresis in the EH transition of a rf inductively coupled plasma system

A. M. Daltrini, S. A. Moshkalev, T. J. Morgan, R. B. Piejak, and W. G. Graham

Appl. Phys. Lett. 92, 061504 (2008); http://dx.doi.org/10.1063/1.2844885 (3 pages) | Cited 23 times

Online Publication Date: 13 February 2008

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An experimental investigation of the argon plasma behavior near the EH transition in an inductively coupled Gaseous Electronics Conference reference cell is reported. Electron density and temperature, ion density, argon metastable density, and optical emission measurements have been made as function of input power and gas pressure. When plotted versus plasma power, applied power corrected for coil and hardware losses, no hysteresis is observed in the measured plasma parameter dependence at the EH mode transition. This suggests that hysteresis in the EH mode transition is due to ignoring inherent power loss, primarily in the matching system.
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52.70.Kz Optical (ultraviolet, visible, infrared) measurements
52.25.-b Plasma properties
52.80.-s Electric discharges
52.35.Qz Microinstabilities (ion-acoustic, two-stream, loss-cone, beam-plasma, drift, ion- or electron-cyclotron, etc.)
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