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Applied Physics Letters / Volume 93 / Issue 11 / LASERS, OPTICS, AND OPTOELECTRONICS

Appl. Phys. Lett. 93, 111116 (2008); http://dx.doi.org/10.1063/1.2985898 (3 pages)

Projecting deep-subwavelength patterns from diffraction-limited masks using metal-dielectric multilayers

Yi Xiong1, Zhaowei Liu1, and Xiang Zhang1,2

1NSF Nanoscale Science and Engineering Center (NSEC), University of California, Berkeley, California 94720, USA
2Materials Sciences Division, Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720, USA

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(Received 19 August 2008; accepted 28 August 2008; published online 19 September 2008)

We utilize a metal-dielectric multilayer structure to generate deep-subwavelength one-dimensional and two-dimensional periodic patterns with diffraction-limited masks. The working wavelength and the pattern are set by the flexible design of the multilayer structure. This scheme is suitable to be applied to deep-subwavelength photolithography. As an example, we numerically demonstrate pattern periods down to 50 nm under 405 nm light illumination.

© 2008 American Institute of Physics

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KEYWORDS and PACS

Keywords

dielectric materials, masks, metals, multilayers, nanolithography, nanopatterning, photolithography

PACS

  • 81.16.Rf

    Micro- and nanoscale pattern formation

  • 81.16.Nd

    Micro- and nanolithography

ARTICLE DATA

Digital Object Identifier
http://dx.doi.org/10.1063/1.2985898

PUBLICATION DATA

ISSN

0003-6951 (print)  
1077-3118 (online)

Publisher

$abstract.society.value is a Member of CrossRef American Institute of Physics

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