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Appl. Phys. Lett. 93, 111911 (2008); http://dx.doi.org/10.1063/1.2987423 (3 pages)
Defect-controlled growth of GaN nanorods on (0001)sapphire by molecular beam epitaxy
(Received 23 July 2008; accepted 27 August 2008; published online 18 September 2008)
0} planes and bounded by opposite partial screw dislocations with Burgers vectors of 1/2〈0001〉. The faults nucleate, as dislocation half-loops, from points close to the GaN/(0001)sapphire interface. It is proposed that the spiral growth of the partial atomic step joining the emerging dislocations controls nanorod growth and accounts for the growth surface morphology. The significance of these defects for nanorod growth and applications is discussed.© 2008 American Institute of Physics
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KEYWORDS and PACS
Keywords
dislocations, gallium compounds, III-V semiconductors, molecular beam epitaxial growth, nanotechnology, semiconductor growth, surface morphology, transmission electron microscopy
PACS
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Methods of micro- and nanofabrication and processing
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Structure of clean surfaces (and surface reconstruction)
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Semiconductor surfaces
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III-V semiconductors
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Molecular, atomic, ion, and chemical beam epitaxy
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Nanoscale materials and structures: fabrication and characterization
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Direct observation of dislocations and other defects (etch pits, decoration, electron microscopy, x-ray topography, etc.)
ARTICLE DATA
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