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8 Dec 2008

Volume 93, Issue 23, Articles (23xxxx)

Issue Cover Spotlight Figure

Appl. Phys. Lett. 93, 231101 (2008); http://dx.doi.org/10.1063/1.3040686 (3 pages)

Mads Brøkner Christiansen, Anders Kristensen, Sanshui Xiao, and Niels Asger Mortensen
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Underwater microdischarge in arranged microbubbles produced by electrolysis in electrolyte solution using fabric-type electrode

Osamu Sakai, Masaru Kimura, Tatsuru Shirafuji, and Kunihide Tachibana

Appl. Phys. Lett. 93, 231501 (2008); http://dx.doi.org/10.1063/1.3006348 (3 pages) | Cited 9 times

Online Publication Date: 8 December 2008

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Pulsed microdischarge was generated in microbubbles produced by electrolysis in an electrolyte solution without external gas feed by using a fabric-type electrode. The electrode structure not only allowed low-voltage ignition of the atmospheric-pressure discharge in hydrogen or oxygen containing microbubbles but also worked effectively in producing and holding the bubbles on its surface. The generation of reactive species was verified by optical emissions from the produced microplasmas, and their transport into the solution was monitored by the change in hydrogen concentration.
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52.50.-b Plasma production and heating
52.80.-s Electric discharges
52.25.Os Emission, absorption, and scattering of electromagnetic radiation
82.45.Fk Electrodes
82.45.Gj Electrolytes
82.45.Hk Electrolysis
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Positive ion polymerization in hydrogen diluted silane plasmas

S. Nunomura and M. Kondo

Appl. Phys. Lett. 93, 231502 (2008); http://dx.doi.org/10.1063/1.3042263 (3 pages) | Cited 8 times

Online Publication Date: 9 December 2008

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Mass spectra of positive ions (cations) and neutrals have been measured in hydrogen diluted silane plasmas at gas pressures of 0.1–10 Torr. The mass spectrum of ions changes with the pressure, while that of neutrals maintains a similar shape. The dominant ion species varies from a hydrogen ion group at ≲0.5 Torr to a monosilicon hydride ion group at ≈ 0.5–1 Torr and polysilicon hydride ion groups at ≳1 Torr, which is determined from ionization channels and consecutive ion-molecule reactions. The ion bombardment is suppressed with the pressure, from several tens of eV at ≲1 Torr to a few eV at ≳7 Torr.
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82.35.-x Polymers: properties; reactions; polymerization
82.30.Fi Ion-molecule, ion-ion, and charge-transfer reactions
82.33.Ya Chemistry of MOCVD and other vapor deposition methods
81.15.Gh Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.)
52.77.Dq Plasma-based ion implantation and deposition
82.33.Xj Plasma reactions (including flowing afterglow and electric discharges)
82.80.Ms Mass spectrometry (including SIMS, multiphoton ionization and resonance ionization mass spectrometry, MALDI)
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Observation of collisionless heating of low energy electrons in low pressure inductively coupled argon plasmas

Min-Hyong Lee, Hyo-Chang Lee, and Chin-Wook Chung

Appl. Phys. Lett. 93, 231503 (2008); http://dx.doi.org/10.1063/1.3042264 (3 pages) | Cited 9 times

Online Publication Date: 11 December 2008

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Collisionless heating of low energy electrons was observed in low pressure argon rf-biased inductively coupled plasmas (ICPs) by measurement of the electron energy distribution function (EEDF). When only capacitive power (bias) was supplied, the EEDF in the discharge was a bi-Maxwellian distribution with two electron groups. It was found that the low energy electrons were heated up significantly even with a little inductive power (<20 W) even when the discharge was in E mode. Due to the low gas pressure and low temperature of low energy electrons (close to the energy of the Ramsauer minimum), the collisional heating of low energy electrons appears to be negligible. Therefore, this effective heating of the low energy electrons showed a direct experimental evidence of the collisionless heating by inductive field. The significant heating of low energy electrons in E mode indicates that collisionless heating in the skin layer is an important electron heating mechanism of low pressure ICP even when the discharge is in E mode.
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52.50.-b Plasma production and heating
52.80.Pi High-frequency and RF discharges
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