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29 Dec 2008

Volume 93, Issue 26, Articles (26xxxx)

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Appl. Phys. Lett. 93, 261101 (2008); http://dx.doi.org/10.1063/1.3053074 (3 pages)

Takashi Fujikura, Osamu Matsuda, Dieter M. Profunser, Oliver B. Wright, Jeremy Masson, and Sylvain Ballandras
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A continuous kilohertz Cu Kα source produced by submillijoule femtosecond laser pulses for phase contrast imaging

J. A. Chakera, A. Ali, Y. Y. Tsui, and R. Fedosejevs

Appl. Phys. Lett. 93, 261501 (2008); http://dx.doi.org/10.1063/1.3046727 (3 pages) | Cited 5 times

Online Publication Date: 29 December 2008

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We report a continuously operated Cu Kα x-ray source produced by a commercial kilohertz submillijoule femtosecond laser system. The source has an x-ray conversion of ∼ 4×10−5 into Kα line emission at 8.05 keV. The microplasma x-ray source has a size of 8 μm (full width at half maximum) produced by focusing 260 μJ laser pulses on a moving Cu-wire target. An average photon flux of ∼ 1.1×109 photons/sr/s is obtained using the above laser pulses. The source has been used to record phase contrast images of test samples. This compact x-ray source can serve as a low cost operating system for phase contrast imaging in clinical applications.
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07.85.Fv X- and γ-ray sources, mirrors, gratings, and detectors
52.50.Dg Plasma sources
52.50.Jm Plasma production and heating by laser beams (laser-foil, laser-cluster, etc.)
52.25.Os Emission, absorption, and scattering of electromagnetic radiation

Diagnostics of ballistic electrons in a dc/rf hybrid capacitively coupled discharge

Lin Xu, Lee Chen, Merritt Funk, Alok Ranjan, Mike Hummel, Ron Bravenec, Radha Sundararajan, Demetre J. Economou, and Vincent M. Donnelly

Appl. Phys. Lett. 93, 261502 (2008); http://dx.doi.org/10.1063/1.3062853 (3 pages) | Cited 10 times

Online Publication Date: 31 December 2008

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The energy distribution of ballistic electrons in a dc/rf hybrid parallel-plate capacitively coupled plasma reactor was measured. Ballistic electrons originated as secondaries produced by ion and electron bombardment of the electrodes. The energy distribution of ballistic electrons peaked at the value of the negative bias applied to the dc electrode. As that bias became more negative, the ballistic electron current on the rf substrate electrode increased dramatically. The ion current on the dc electrode also increased.
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52.70.Ds Electric and magnetic measurements
73.23.Ad Ballistic transport
61.80.Fe Electron and positron radiation effects
61.80.Jh Ion radiation effects
52.80.Pi High-frequency and RF discharges

Electron heating in radio-frequency capacitively coupled atmospheric-pressure plasmas

D. W. Liu, F. Iza, and M. G. Kong

Appl. Phys. Lett. 93, 261503 (2008); http://dx.doi.org/10.1063/1.3058686 (3 pages) | Cited 20 times

Online Publication Date: 31 December 2008

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In atmospheric-pressure plasmas the main electron heating mechanism is Ohmic heating, which has distinct spatial and temporal evolutions in the α and γ modes. In γ discharges, ionizing avalanches in the sheaths are initiated not only by secondary electrons but also by metastable pooling reactions. In α discharges, heating takes place at the sheath edges and in contrast with low-pressure plasmas, close to 50% of the power absorbed by the electrons is absorbed at the edge of the retreating sheaths. This heating is due to a field enhancement caused by the large collisionality in atmospheric-pressure discharges.
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52.50.Nr Plasma heating by DC fields; ohmic heating, arcs
52.50.Qt Plasma heating by radio-frequency fields; ICR, ICP, helicons
52.80.-s Electric discharges
52.40.Kh Plasma sheaths

Plasma-controlled adatom delivery and (re)distribution: Enabling uninterrupted, low-temperature growth of ultralong vertically aligned single walled carbon nanotubes

Eugene Tam and Kostya (Ken) Ostrikov

Appl. Phys. Lett. 93, 261504 (2008); http://dx.doi.org/10.1063/1.3058766 (3 pages) | Cited 7 times

Online Publication Date: 31 December 2008

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Large-scale ( ∼ 109 atoms) numerical simulations reveal that plasma-controlled dynamic delivery and redistribution of carbon atoms between the substrate and nanotube surfaces enable the growth of ultralong single walled carbon nanotubes (SWCNTs) and explain the common experimental observation of slower growth at advanced stages. It is shown that the plasma-based processes feature up to two orders of magnitude higher growth rates than equivalent neutral-gas systems and are better suited for the SWCNT synthesis at low nanodevice friendly temperatures.
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81.07.De Nanotubes
61.48.De Structure of carbon nanotubes, boron nanotubes, and other related systems
81.15.Jj Ion and electron beam-assisted deposition; ion plating
52.77.Dq Plasma-based ion implantation and deposition
81.16.-c Methods of micro- and nanofabrication and processing
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