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Applied Physics Letters / Volume 93 / Issue 3 / PLASMAS AND ELECTRICAL DISCHARGES

Appl. Phys. Lett. 93, 031504 (2008); http://dx.doi.org/10.1063/1.2945890 (3 pages)

Modulating effects of the low-frequency source on ion energy distributions in a dual frequency capacitively coupled plasma

Xiao-Song Li, Zhen-Hua Bi, Da-Lei Chang, Zhi-Cheng Li, Shuai Wang, Xiang Xu, Yong Xu, Wen-Qi Lu, Ai-Min Zhu, and You-Nian Wang

State Key Laboratory of Materials Modification by Beams, School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, People’s Republic of China

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(Received 1 May 2008; accepted 28 May 2008; published online 24 July 2008)

With the energy resolved quadrupole mass spectrometer and hybrid simulation, the influence of low-frequency (LF) source parameters on the ion energy distributions (IEDs) of argon ions impinging on the grounded electrode was studied, both experimentally and numerically, in a dual frequency capacitively coupled plasma. It was shown that for decreasing LF or increasing LF power, the high energy peak in IEDs shifts toward the high energy region significantly. The simulation results were in general agreement with the experimental data.

© 2008 American Institute of Physics

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KEYWORDS and PACS

Keywords

argon, hybrid simulation, mass spectroscopy, plasma diagnostics, plasma properties, plasma simulation, plasma sources

PACS

ARTICLE DATA

Digital Object Identifier
http://dx.doi.org/10.1063/1.2945890

PUBLICATION DATA

ISSN

0003-6951 (print)  
1077-3118 (online)

Publisher

$abstract.society.value is a Member of CrossRef American Institute of Physics

For access to fully linked references, you need to log in.
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