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21 Jul 2008

Volume 93, Issue 3, Articles (03xxxx)

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Appl. Phys. Lett. 93, 031101 (2008); http://dx.doi.org/10.1063/1.2959092 (3 pages)

Di Xu, Kevin P. Chen, Kris Ohlinger, and Yuankun Lin
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Development of a trielectrode plasma curtain at atmospheric pressure

H. Zastawny, R. Sosa, D. Grondona, A. Márquez, G. Artana, and H. Kelly

Appl. Phys. Lett. 93, 031501 (2008); http://dx.doi.org/10.1063/1.2960996 (3 pages) | Cited 2 times

Online Publication Date: 23 July 2008

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The development of a nonequilibrium, low-power, trielectrode plasma curtain at atmospheric pressure is presented. The discharge is based on the combination of an ac dielectric barrier discharge with a dc corona discharge in a three electrode system, and can be sustained for large time periods and over interelectrode air gaps up to 20 mm and with an electrode length of ∼ 10 cm in the transversal direction. The discharge is composed of a train of streamers, with a repetition frequency in the range 50–200 kHz, and carrying an average current in the range 0.1–0.4 mA. The geometry of the discharge makes it appropriate for gas decontamination.
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52.50.Dg Plasma sources
52.80.Hc Glow; corona

Multiple substrate microwave plasma-assisted chemical vapor deposition single crystal diamond synthesis

J. Asmussen, T. A. Grotjohn, T. Schuelke, M. F. Becker, M. K. Yaran, D. J. King, S. Wicklein, and D. K. Reinhard

Appl. Phys. Lett. 93, 031502 (2008); http://dx.doi.org/10.1063/1.2961016 (3 pages) | Cited 6 times

Online Publication Date: 23 July 2008

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A multiple substrate, microwave plasma-assisted chemical vapor deposition synthesis process for single crystal diamond (SCD) is demonstrated using a 915 MHz reactor. Diamond synthesis was performed using input chemistries of 6–8% of CH4/H2, microwave input powers of 10–11.5 kW, substrate temperatures of 1100–1200 °C, and pressures of 110–135 Torr. The simultaneous synthesis of SCD over 70 diamond seeds yielded good quality SCD with deposition rates of 14–21 μm/h. Multiple deposition runs totaling 145 h of deposition time added 1.8–2.5 mm of diamond material to each of the 70 seed crystals.
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81.15.Gh Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.)
52.77.Dq Plasma-based ion implantation and deposition
68.55.aj Insulators

Influence of operating pressure on surface dielectric barrier discharge plasma aerodynamic actuation characteristics

Yun Wu, Yinghong Li, Min Jia, Huimin Song, Zhigang Guo, Ximing Zhu, and Yikang Pu

Appl. Phys. Lett. 93, 031503 (2008); http://dx.doi.org/10.1063/1.2964193 (3 pages) | Cited 9 times

Online Publication Date: 24 July 2008

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This letter reports an experimental study of surface dielectric barrier discharge plasma aerodynamic actuation characteristics’ dependence on operating pressure. As the pressure decreases, the N2(C3Пu) rotational temperature decreases, while its vibrational temperature decreases initially and then increases. In addition, the discharge mode changes from a filamentary type to a glow type at 45 Torr. In the filamentary mode, the electron density decreases with pressure, while the electron temperature remains almost unchanged. In the glow mode, however, both the electron density and the electron temperature increase while the pressure decreases. The induced velocity shows a maximum value at 445 Torr.
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52.30.-q Plasma dynamics and flow
52.35.Py Macroinstabilities (hydromagnetic, e.g., kink, fire-hose, mirror, ballooning, tearing, trapped-particle, flute, Rayleigh-Taylor, etc.)
52.80.Hc Glow; corona
47.85.Gj Aerodynamics

Modulating effects of the low-frequency source on ion energy distributions in a dual frequency capacitively coupled plasma

Xiao-Song Li, Zhen-Hua Bi, Da-Lei Chang, Zhi-Cheng Li, Shuai Wang, Xiang Xu, Yong Xu, Wen-Qi Lu, Ai-Min Zhu, and You-Nian Wang

Appl. Phys. Lett. 93, 031504 (2008); http://dx.doi.org/10.1063/1.2945890 (3 pages) | Cited 21 times

Online Publication Date: 24 July 2008

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With the energy resolved quadrupole mass spectrometer and hybrid simulation, the influence of low-frequency (LF) source parameters on the ion energy distributions (IEDs) of argon ions impinging on the grounded electrode was studied, both experimentally and numerically, in a dual frequency capacitively coupled plasma. It was shown that for decreasing LF or increasing LF power, the high energy peak in IEDs shifts toward the high energy region significantly. The simulation results were in general agreement with the experimental data.
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52.25.-b Plasma properties
52.50.Dg Plasma sources
52.65.Ww Hybrid methods
52.70.Nc Particle measurements

Design of fine phosphor system for the improvement in the luminescent properties of the phosphor layer in the plasma display panel: Theoretical and experimental analysis

Chae-Woong Cho, Ungyu Paik, Do-Hyung Park, Yoon-Chang Kim, and Dong-Sik Zang

Appl. Phys. Lett. 93, 031505 (2008); http://dx.doi.org/10.1063/1.2963477 (3 pages) | Cited 10 times

Online Publication Date: 25 July 2008

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Improvement in the luminescent properties of plasma display panels via phosphor size control was theoretically and experimentally investigated. From theoretical analyses of photon extraction and plasma efficiency, fine phosphor system was designed, which was compared with experimental data. The denser microstructure of finer phosphor-based layer promoted photon extraction efficiency by higher reflectivity. Also, the finer phosphor increased vacuum-ultraviolet discharge space and corresponding plasma efficiency via decrease in layer thickness. Based on the results, the phosphor size control improved the panel efficiency by the synergistic effect of improvements in photon extraction and plasma efficiency.
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85.60.Pg Display systems
52.75.-d Plasma devices
78.60.-b Other luminescence and radiative recombination

Experimental observation of the inductive electric field and related plasma nonuniformity in high frequency capacitive discharge

S. K. Ahn and H. Y. Chang

Appl. Phys. Lett. 93, 031506 (2008); http://dx.doi.org/10.1063/1.2965118 (3 pages) | Cited 5 times

Online Publication Date: 25 July 2008

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To elucidate plasma nonuniformity in high frequency capacitive discharges, Langmuir probe and B-dot probe measurements were carried out in the radial direction in a cylindrical capacitive discharge driven at 90 MHz with argon pressures of 50 and 400 mTorr. Through the measurements, a significant inductive electric field (i.e., time-varying magnetic field) was observed at the radial edge, and it was found that the inductive electric field creates strong plasma nonuniformity at high pressure operation. The plasma nonuniformity at high pressure operation is physically similar to the E-H mode transition typically observed in inductive discharges. This result agrees well with the theories of electromagnetic effects in large area and/or high frequency capacitive discharges.
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52.70.Ds Electric and magnetic measurements
52.80.Pi High-frequency and RF discharges
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