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1 Sep 2008

Volume 93, Issue 9, Articles (09xxxx)

Issue Cover Spotlight Figure

Appl. Phys. Lett. 93, 091901 (2008); http://dx.doi.org/10.1063/1.2976330 (3 pages)

Fang-Fang Ren, M. B. Yu, J. D. Ye, Q. Chen, S. T. Tan, G. Q. Lo, and D. L. Kwong
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Plasmon enhanced fluorescence microscopy below quantum noise limit with reduced photobleaching effect

Partha Pratim Mondal, Richard J. Gilbert, and Peter T. C. So

Appl. Phys. Lett. 93, 093901 (2008); http://dx.doi.org/10.1063/1.2973905 (3 pages) | Cited 2 times

Online Publication Date: 4 September 2008

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We propose a plasmon enhanced fluorescence microscopy technique below the quantum noise limit. This is achieved by exciting fluorescent molecules with photon number squeezed (PNS) light and using nanoparticles as an enhancer for overcoming the low absorption cross section. PNS light has an inherent sub-Poissonian photon distribution for which the variance Δn<math. PNS light has the added advantage of antibunching, which eliminates photobleaching due to higher order photon interactions. We anticipate that single molecule studies will benefit from such a radiation source.
Show PACS
07.60.Pb Conventional optical microscopes
42.50.Gy Effects of atomic coherence on propagation, absorption, and amplification of light; electromagnetically induced transparency and absorption
42.50.Dv Quantum state engineering and measurements
42.65.-k Nonlinear optics
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