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1 Sep 2008

Volume 93, Issue 9, Articles (09xxxx)

Issue Cover Spotlight Figure

Appl. Phys. Lett. 93, 091901 (2008); http://dx.doi.org/10.1063/1.2976330 (3 pages)

Fang-Fang Ren, M. B. Yu, J. D. Ye, Q. Chen, S. T. Tan, G. Q. Lo, and D. L. Kwong
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Theoretical investigation of sheath expansion and implant fluence uniformity in enhanced glow discharge plasma immersion ion implantation

Dixon T. K. Kwok, Qiu Yuan Lu, Liu He Li, Ricky K. Y. Fu, and Paul K. Chu

Appl. Phys. Lett. 93, 091501 (2008); http://dx.doi.org/10.1063/1.2977962 (3 pages) | Cited 4 times

Online Publication Date: 2 September 2008

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In enhanced glow discharge plasma immersion ion implantation that involves a small-pointed anode and large area tabular cathode, the high negative substrate bias acts as the plasma producer and supplies the implantation voltage. An electric field is created to focus the electrons and the electron-focusing field in turn enhances the glow discharge process. The sheath physics is theoretically investigated using numerical simulation based on the multiple-grid particle-in-cell code. Electron focusing is corroborated and the plasma sheath has enough expansion when t = 40 μs so that a uniform distribution of the incident ion fluence is attained.
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52.40.Kh Plasma sheaths
52.25.Fi Transport properties
52.65.Rr Particle-in-cell method
52.77.Dq Plasma-based ion implantation and deposition
52.80.Hc Glow; corona

Laser wavelength dependence of extreme ultraviolet light and particle emissions from laser-produced lithium plasmas

Akihisa Nagano, Takayasu Mochizuki, Shuji Miyamoto, and Sho Amano

Appl. Phys. Lett. 93, 091502 (2008); http://dx.doi.org/10.1063/1.2975180 (3 pages) | Cited 4 times

Online Publication Date: 4 September 2008

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Maximum extreme ultraviolet (EUV) conversion efficiencies (CEs) of 2.3% and 1.8% were achieved in planar Li targets by using pulsed 2ω and 1ω Nd:YAG laser irradiation, respectively. In a forced recombination scheme, the total CE can be expected to be about 4%. The maximum kinetic energy of the lithium ion debris was found to be less than 1 keV, indicating that mirror damage caused by lithium ion debris is more easily mitigated by using a magnetic field than for tin ions. These results suggest that a Li target is a reasonable candidate for an EUV lithography source.
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52.25.Os Emission, absorption, and scattering of electromagnetic radiation
52.25.Tx Emission, absorption, and scattering of particles
52.50.Jm Plasma production and heating by laser beams (laser-foil, laser-cluster, etc.)

Highly efficient electron beam generation in a wide-aperture discharge in helium

E. V. Belskaya, P. A. Bokhan, and Dm. E. Zakrevsky

Appl. Phys. Lett. 93, 091503 (2008); http://dx.doi.org/10.1063/1.2978350 (3 pages) | Cited 2 times

Online Publication Date: 5 September 2008

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The paper deals with a gas discharge having electron beam generation efficiency η ≃ 100% at a voltage U>300 V. The discharge has been realized in helium in a cell with a cathode diameter of 19.5 cm. The discharge features are a higher η as compared to other discharges, the presence of reverse bends in the voltage-current characteristics including the occurrence of a falling section, and nonmonotony in η(U) and its growth with increasing He pressure. The discharge peculiarities are explained by its photoemissive nature. The basic contribution to the photoemission is made by the emission from the resonance state excited in the secondary processes.
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52.80.Hc Glow; corona
41.75.Fr Electron and positron beams
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