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Appl. Phys. Lett. 94, 161906 (2009); http://dx.doi.org/10.1063/1.3120229 (3 pages)

Selective area wavelength tuning of InAs/GaAs quantum dots obtained by TiO2 and SiO2 layer patterning

H. S. Lee1, A. Rastelli1, S. Kiravittaya1, P. Atkinson2, C. C. Bof Bufon1, I. Mönch1, and O. G. Schmidt1

1Institute for Integrative Nanosciences, IFW Dresden, Helmholtzstr. 20, D-01069 Dresden, Germany
2Max-Planck-Institut für Festkörperforschung, Heisenbergstr. 1, D-70569 Stuttgart, Germany

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(Received 9 March 2009; accepted 25 March 2009; published online 22 April 2009)

Selective area wavelength tuning of InAs quantum dots (QDs) in GaAs matrix is achieved by patterning TiO2 and SiO2 layers on the sample surface followed by rapid thermal processing. After heat treatment, the QD emission under the SiO2 capped areas shows pronounced blueshifts compared with regions capped with TiO2/SiO2, where interdiffusion is strongly suppressed. Finite element calculations of the strain generated by the different thermal expansion coefficients of GaAs, SiO2, and TiO2 at high temperature are used to interpret the results. This method may provide a simple route to achieve monolithic integration of optoelectronic devices based on QDs.

© 2009 American Institute of Physics

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KEYWORDS and PACS

PACS

  • 73.21.La

    Quantum dots

  • 66.30.Pa

    Diffusion in nanoscale solids

  • 81.07.Ta

    Quantum dots

  • 66.30.Ny

    Chemical interdiffusion; diffusion barriers

  • 78.67.Hc

    Quantum dots

  • 78.55.Cr

    III-V semiconductors

  • 65.40.De

    Thermal expansion; thermomechanical effects

  • 65.80.-g

    Thermal properties of small particles, nanocrystals, nanotubes, and other related systems

ARTICLE DATA

PUBLICATION DATA

ISSN

0003-6951 (print)  
1077-3118 (online)

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