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9 Feb 2009

Volume 94, Issue 6, Articles (06xxxx)

Appl. Phys. Lett. 94, 062105 (2009); http://dx.doi.org/10.1063/1.3079078 (3 pages)

Ikai Lo, Chia-Ho Hsieh, Yu-Chi Hsu, Wen-Yuan Pang, and Ming-Chi Chou

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Erratum: “Noble gas retention in the target during rotating cylindrical magnetron sputtering” [Appl. Phys. Lett. 93, 061501 (2008)]

S. Mahieu, W. P. Leroy, D. Depla, S. Schreiber, and W. Möller

Appl. Phys. Lett. 94, 069901 (2009); http://dx.doi.org/10.1063/1.3086270 (1 page)

Online Publication Date: 10 February 2009

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99.10.Cd	Errata
85.30.Tv	Field effect devices

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