• Volume/Page
  • Keyword
  • DOI
  • Citation
  • Advanced
   
 
 
 

Flickr Twitter iResearch App Facebook

Year Range: 
Search Issue | RSS Feeds RSS
Previous Issue Next Issue

3 Aug 2009

Volume 95, Issue 5, Articles (05xxxx)

Issue Cover Spotlight Figure

Appl. Phys. Lett. 95, 052901 (2009); http://dx.doi.org/10.1063/1.3190518 (3 pages)

Didit Yudistira, Sarah Benchabane, Davide Janner, and Valerio Pruneri
back to top
RSS Feeds

Observation and quantification of OH radicals in the far downstream part of an atmospheric microwave plasma jet using cavity ringdown spectroscopy

Chuji Wang, Nimisha Srivastava, and Theodore S. Dibble

Appl. Phys. Lett. 95, 051501 (2009); http://dx.doi.org/10.1063/1.3177314 (3 pages) | Cited 5 times

Online Publication Date: 3 August 2009

Full Text: Read Online (HTML) | Download PDF

Show Abstract
An atmospheric argon microwave plasma jet with a plasma column 8 mm long and 1–2 mm wide is studied. Existence of hydroxyl (OH) radicals down to 28 mm away from the plasma orifice is evidenced by UV cavity ringdown spectroscopy. The measured OH (v″ = 0, J″ = 3.5) number density at 28 mm is 7.2×1012 molecule/cm3. The plasma gas flow velocity, along with the known OH lifetimes, suggests that OH radicals observed in the downstream are not the OH radicals formed in the plasma column but were formed in the downstream.
Show PACS
52.20.Hv Atomic, molecular, ion, and heavy-particle collisions
52.75.-d Plasma devices
33.70.Ca Oscillator and band strengths, lifetimes, transition moments, and Franck-Condon factors

Current scaling in an atmospheric pressure capillary dielectric barrier discharge

Brian L. Sands, Shih K. Huang, and Biswa N. Ganguly

Appl. Phys. Lett. 95, 051502 (2009); http://dx.doi.org/10.1063/1.3187939 (3 pages) | Cited 3 times

Online Publication Date: 4 August 2009

Full Text: Read Online (HTML) | Download PDF

Show Abstract
Current scaling in an atmospheric pressure capillary dielectric barrier discharge, comprising a structured rare gas flow that extends into ambient air, is characterized by electrical and optical measurements. In the transient glow mode, two current scaling regimes were identified that are separated by the static free shear flow boundary. The peak current was sensitive to cathode placement relative to this flow structure and could be scaled from ∼ 300 mA to over 5 A. Applying a Boltzmann equation solver, it was found that ∼ 1% air entrainment into the flow and an E/N≲5×10−16 V cm−2 could account for the observed trends.
Show PACS
52.80.Hc Glow; corona
52.30.-q Plasma dynamics and flow

Surface-plasmon-enhanced photoluminescence from metal-capped Alq3 thin Films

Man Chun Tam, Huimin Su, Kam Sing Wong, Xiuling Zhu, and Hoi Sing Kwok

Appl. Phys. Lett. 95, 051503 (2009); http://dx.doi.org/10.1063/1.3190501 (3 pages) | Cited 6 times

Online Publication Date: 6 August 2009

Full Text: Read Online (HTML) | Download PDF

Show Abstract
Absolute quantum efficiencies of surface-plasmon-enhanced photoluminescence from Au capped Alq3 films were measured using an integrating sphere. The metal “mirror” and directional enhancement effects due to surface roughness which usually occur in forward/backward collection measurements were eliminated using this integrating sphere technique. Up to 40% of the enhanced photoluminescence observed using the forward/backward collection method was shown to have come from mirror and/or enhanced directional scattering effects. Purcell factors obtained from the integrating sphere data and from time-resolved photoluminescence measurements were consistent, confirming surface-plasmon coupling. Incorporating a thin spacer layer enhanced the quantum efficiency and also eliminated nonradiative recombination due to the metal layer. The results clearly show the importance of using an integrating sphere when measuring overall surface-plasmon quantum efficiencies to eliminate directional scattering effects.
Show PACS
78.55.Kz Solid organic materials
78.66.Qn Polymers; organic compounds
73.20.Mf Collective excitations (including excitons, polarons, plasmons and other charge-density excitations)
68.35.bg Semiconductors

Temporal evolution of double layers in pulsed helicon plasmas

Ioana A. Biloiu and Earl E. Scime

Appl. Phys. Lett. 95, 051504 (2009); http://dx.doi.org/10.1063/1.3204014 (3 pages) | Cited 4 times

Online Publication Date: 7 August 2009

Full Text: Read Online (HTML) | Download PDF

Show Abstract
Delays of the order of tens of milliseconds in the appearance of the fast argon ion population in the expansion region of a pulsed helicon plasma are observed in time-resolved, laser induced fluorescence measurements. The fast ion population is a proxy for the presence of a double layer. The magnitude of the time delay depends strongly on the length of the interval between plasma pulses; the shorter the time between pulses, the shorter the time delay. The time delay approaches zero for inter-pulse intervals smaller than 30 ms. The double layer strength is not affected by plasma source modulation frequency.
Show PACS
52.40.Kh Plasma sheaths
72.30.+q High-frequency effects; plasma effects
Close
Google Calendar
ADVERTISEMENT

close