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Appl. Phys. Lett. 96, 222101 (2010); http://dx.doi.org/10.1063/1.3429586 (3 pages)
Permanent optical doping of amorphous metal oxide semiconductors by deep ultraviolet irradiation at room temperature
(Received 19 February 2010; accepted 19 April 2010; published online 1 June 2010)
© 2010 American Institute of Physics
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KEYWORDS and PACS
Keywords
amorphous semiconductors, carrier density, carrier mobility, conduction bands, Fermi level, gallium compounds, II-VI semiconductors, indium compounds, semiconductor doping, semiconductor thin films, thin film transistors, two-photon processes, ultraviolet radiation effects, wide band gap semiconductors
PACS
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Semiconductors
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Amorphous semiconductors, metallic glasses, glasses
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Amorphous semiconductors; glasses
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II-VI semiconductors
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Low-field transport and mobility; piezoresistance
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Ultraviolet, visible, and infrared radiation effects (including laser radiation)
ARTICLE DATA
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Q. H. Li, Q. Wan, Y. X. Liang, and T. H. Wang, Appl. Phys. Lett. 84, 4556 (2004)APPLAB000084000022004556000001.
J. K. Jeong, H. W. Yang, J. H. Jeong, Y. G. Mo, and H. D. Kim, Appl. Phys. Lett. 93, 123508 (2008)APPLAB000093000012123508000001.
K. Nomura, T. Kamiya, H. Ohta, K. Ueda, M. Hirano, and H. Hosono, Appl. Phys. Lett. 85, 1993 (2004)APPLAB000085000011001993000001.
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