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Appl. Phys. Lett. 96, 222101 (2010); http://dx.doi.org/10.1063/1.3429586 (3 pages)

Permanent optical doping of amorphous metal oxide semiconductors by deep ultraviolet irradiation at room temperature

Hyungtak Seo1, Young-Je Cho2, Jinwoo Kim3, Santosh M.bobade2, Kyoung-Youn Park2, Jaegab Lee4, and Duck-Kyun Choi2

1Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA
2Division of Materials Science and Engineering, Hanyang University, Seoul 133-791, Republic of Korea
3Department of Materials Sciences and Engineering, North Carolina State University, Raleigh, North Carolina 27695, USA
4School of Advanced Materials Engineering, Kookmin University, Seoul 136-702, Republic of Korea

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(Received 19 February 2010; accepted 19 April 2010; published online 1 June 2010)

We report an investigation of two photon ultraviolet (UV) irradiation induced permanent n-type doping of amorphous InGaZnO (a-IGZO) at room temperature. The photoinduced excess electrons were donated to change the Fermi-level to a conduction band edge under the UV irradiation, owing to the hole scavenging process at the oxide interface. The use of optically n-doped a-IGZO channel increased the carrier density to ∼ 1018 cm−3 from the background level of 1016 cm−3, as well as the comprehensive enhancement upon UV irradiation of a-IGZO thin film transistor parameters, such as an on-off current ratio at ∼ 108 and field-effect mobility at 22.7 cm2/V s.

© 2010 American Institute of Physics

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KEYWORDS and PACS

PACS

  • 61.82.Fk

    Semiconductors

  • 71.23.Cq

    Amorphous semiconductors, metallic glasses, glasses

  • 73.61.Jc

    Amorphous semiconductors; glasses

  • 73.61.Ga

    II-VI semiconductors

  • 73.50.Dn

    Low-field transport and mobility; piezoresistance

  • 61.80.Ba

    Ultraviolet, visible, and infrared radiation effects (including laser radiation)

ARTICLE DATA

PUBLICATION DATA

ISSN

0003-6951 (print)  
1077-3118 (online)

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