• Volume/Page
  • Keyword
  • DOI
  • Citation
  • Advanced
   
 
 
 

Flickr Twitter UniPHY Group iResearch App Facebook

Appl. Phys. Lett. 96, 222508 (2010); http://dx.doi.org/10.1063/1.3443715 (3 pages)

Control of magnetic and electric responses with electric and magnetic fields in magnetoelectric heterostructures

J. Das1, M. Li1, S. S. Kalarickal2,3, S. Altmannshofer3, K. S. Buchanan3, J. F. Li1, and D. Viehland1

1Department of Materials Science and Engineering, Virginia Tech, Blacksburg, Virginia 24061, USA
2Center for Magnetism and Magnetic Nanostructures, University of Colorado, Colorado Springs, Colorado 80933, USA
3Department of Physics, Colorado State University, Fort Collins, Colorado 80523, USA

View MapView Map

(Received 16 April 2010; accepted 12 May 2010; published online 4 June 2010)

This paper reports on the tuning of both magnetic and electric responses with electric and magnetic fields for metglas-Pb (Zr,Ti)O3 based magnetoelectric (ME) heterostructures that can be promising for communication and sensor applications. The hysteresis loop results indicate a change in the in-plane magnetization due to application of voltages that leads to a tuning of the ferromagnetic resonance frequency by up to about 210 MHz with electric field. Furthermore, these structures show a high ME voltage coefficient that results in the detection of a 2 nT ac magnetic field and a low noise floor.

© 2010 American Institute of Physics

RELATED DATABASES

To view database links for this article, you need to log in.

KEYWORDS and PACS

PACS

  • 75.85.+t

    Magnetoelectric effects, multiferroics

  • 75.50.Kj

    Amorphous and quasicrystalline magnetic materials

  • 75.60.Ej

    Magnetization curves, hysteresis, Barkhausen and related effects

ARTICLE DATA

PUBLICATION DATA

ISSN

0003-6951 (print)  
1077-3118 (online)

For access to fully linked references, you need to log in.
    C. -W. Nan, M. I. Bichurin, S. Dong, D. Viehland, and G. Srinivasan, J. Appl. Phys. 103, 031101 (2008)JAPIAU000103000003031101000001.

    J. Das, J. Gao, Z. Xing, J. F. Li, and D. Viehland, Appl. Phys. Lett. 95, 092501 (2009)APPLAB000095000009092501000001.

    S. X. Dong, J. F. Li, and D. Viehland, Appl. Phys. Lett. 83, 2265 (2003)APPLAB000083000011002265000001.

    J. Das, S. S. Kalarickal, K. Kim, and C. E. Patton, Phys. Rev. B 75, 094435 (2007).

    Y. K. Fetisov and G. Srinivasan, Appl. Phys. Lett. 93, 033508 (2008)APPLAB000093000003033508000001.

    G. Srinivasan, I. V. Zavislyak, and A. S. Tatarenko, Appl. Phys. Lett. 89, 152508 (2006)APPLAB000089000015152508000001.


For access to citing articles, you need to log in.


Figures (4)

Access to article objects (figures, tables, multimedia) requires a subscription; log in to view available files.
(Access to supplementary files, where available, is free for this journal.)



Close
Google Calendar
ADVERTISEMENT

close