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Appl. Phys. Lett. 96, 231113 (2010); http://dx.doi.org/10.1063/1.3443719 (3 pages)

Low-threshold-current-density AlGaN-cladding-free m-plane InGaN/GaN laser diodes

R. M. Farrell1, P. S. Hsu2, D. A. Haeger2, K. Fujito3, S. P. DenBaars1,2, J. S. Speck2, and S. Nakamura1,2

1Department of Electrical and Computer Engineering, University of California, Santa Barbara, California 93106, USA
2Materials Department, University of California, Santa Barbara, California 93106, USA
3Optoelectronics Laboratory, Mitsubishi Chemical Corporation, 1000 Higashi-Mamiana, Ushiku, Ibaraki 300-1295, Japan

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(Received 7 April 2010; accepted 13 May 2010; published online 10 June 2010)

We demonstrate AlGaN-cladding-free m-plane InGaN/GaN laser diodes with threshold current densities that are comparable to state-of-the-art c-plane InGaN/GaN laser diodes. Thick InGaN waveguiding layers and a relatively wide active region with three 8 nm quantum wells were used to provide adequate refractive index contrast with the GaN cladding layers, thus eliminating the need for AlGaN cladding layers. Despite the large active region volume, lasing was achieved at a threshold current density of 1.54 kA/cm2, suggesting that the realization of even lower threshold current densities should be possible by reducing the number of quantum wells in the active region.

© 2010 American Institute of Physics

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0003-6951 (print)  
1077-3118 (online)

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