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Appl. Phys. Lett. 96, 261904 (2010); http://dx.doi.org/10.1063/1.3457995 (3 pages)

Composition measurement of the Ni-silicide transient phase by atom probe tomography

K. Hoummada, I. Blum, D. Mangelinck, and A. Portavoce

Aix-Marseille University, IM2NP, CNRS (UMR 6242), Faculté de Saint-Jérôme, Case 142, F-13397 Marseille Cedex, France

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(Received 27 April 2010; accepted 28 May 2010; published online 29 June 2010)

The transient phase observed during the reaction of a Ni(Pt) alloy with a (001)Si substrate is studied using in situ x-ray diffraction and atom probe tomography microscopy. This transient phase exhibits a diffraction peak at 47°, and is found to have a uniform composition corresponding to Ni0.6Si0.4. During the reaction, it is located between a δ-Ni2Si layer and a thin (nanocrystalline or amorphous) NiSi layer in contact with Si. The Pt atoms are found in the δ-Ni2Si grain boundaries, while they have not been detected in the NiSi layer.

© 2010 American Institute of Physics

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KEYWORDS and PACS

PACS

  • 68.35.Fx

    Diffusion; interface formation

  • 82.80.-d

    Chemical analysis and related physical methods of analysis

  • 61.72.Mm

    Grain and twin boundaries

  • 68.55.at

    Other materials

ARTICLE DATA

PUBLICATION DATA

ISSN

0003-6951 (print)  
1077-3118 (online)

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