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Appl. Phys. Lett. 96, 262102 (2010); http://dx.doi.org/10.1063/1.3457862 (3 pages)

Growth, electrical rectification, and gate control in axial in situ doped p-n junction germanium nanowires

Son T. Le1, P. Jannaty1, A. Zaslavsky1, S. A. Dayeh2, and S. T. Picraux2

1Department of Physics, Division of Engineering, Brown University, Providence, Rhode Island 02912, USA
2Center for Integrated Nanotechnologies, Los Alamos National Laboratory, Los Alamos, New Mexico 87545, USA

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(Received 13 May 2010; accepted 7 June 2010; published online 28 June 2010)

We report on vapor-liquid-solid growth and electrical properties of axial in situ doped p-n junction Ge sub-100 nm diameter nanowires. Room temperature four-point measurements show current rectification of two to three orders of magnitude depending on nanowire doping and diameter. We observe strong backgate control of reverse-bias current of up to three orders of magnitude and explain it by band-to-band tunneling modulated by the backgate-controlled electric field, as confirmed qualitatively via a quasi-three-dimensional Schrödinger–Poisson simulation.

© 2010 American Institute of Physics

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KEYWORDS and PACS

PACS

  • 68.65.La

    Quantum wires (patterned in quantum wells)

  • 81.07.Gf

    Nanowires

  • 61.72.U-

    Doping and impurity implantation

  • 85.40.Ry

    Impurity doping, diffusion and ion implantation technology

  • 73.40.Lq

    Other semiconductor-to-semiconductor contacts, p-n junctions, and heterojunctions

ARTICLE DATA

PUBLICATION DATA

ISSN

0003-6951 (print)  
1077-3118 (online)

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