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Appl. Phys. Lett. 96, 262107 (2010); http://dx.doi.org/10.1063/1.3457870 (3 pages)

Enhanced retention characteristic of NiSi2/SiNx compound nanocrystal memory

Jin Lu (闾锦)1,2, Ting-Chang Chang (張鼎張)1,3, Yu-Ting Chen (陳侑廷)3, Jheng-Jie Huang1, Po-Chun Yang3, Shih-Ching Chen1, Hui-Chun Huang4, Der-Shin Gan4, New-Jin Ho4, Yi Shi2, and Ann-Kuo Chu3

1Department of Physics, Center for Nanoscience and Nanotechnology, National Sun Yat-Sen University, Kaohsiung 804, Taiwan
2Department of Physics and National Laboratory of Solid State Microstructures, Nanjing University, Nanjing 210093, People's Republic of China
3Department of Photonics, National Sun Yat-Sen University, Kaohsiung 804, Taiwan
4Department of Materials and Optoelectronic Science, National Sun Yat-Sen University, Kaohsiung 804, Taiwan

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(Received 28 October 2009; accepted 7 June 2010; published online 29 June 2010)

The NiSi2/SiNx compound nanocrystals (CNCs) were fabricated to integrate the compound tunnel barrier into nanocrystal memory, with the inclusion of nitride traps. The analysis of high resolution transmission electron microscopy and x-ray photoelectron spectroscopy reveal that the nanocrystal is mainly composed of NiSi2 and silicon nitride with small size of 4–5 nm and high density of ∼ 1×1012 cm−2. The charge storage characteristics of the memory capacitor based on NiSi2/SiNx CNCs were investigated by capacitance-voltage measurement and the enhanced retention characteristics, which remain 71.7% ( ∼ 1.9 V) in 104 s, are clarified to be due to the compound tunnel barrier and traps in nitride.

© 2010 American Institute of Physics

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0003-6951 (print)  
1077-3118 (online)

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