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Appl. Phys. Lett. 96, 262903 (2010); http://dx.doi.org/10.1063/1.3455326 (3 pages)

Temperature-dependent Raman scattering of KTa1−xNbxO3 thin films

A. Bartasyte1, J. Kreisel1, W. Peng2, and M. Guilloux-Viry2

1Laboratoire Matériaux et Génie Physique, Minatec, Grenoble Institute of Technology, CNRS, 3 parvis Louis Néel, 38016 Grenoble, France
2Sciences Chimiques de Rennes, UMR 6226, CNRS/Université de Rennes 1, Campus de Beaulieu, 35042 Rennes Cedex, France

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(Received 17 March 2010; accepted 28 May 2010; published online 30 June 2010)

We report a Raman scattering investigation of KTa1−xNbxO3 (x = 0.35,0.5) thin films deposited on MgO and LaAlO3 as a function of temperature. The observed phase sequence in the range from 90 to 720 K is similar to the structural phase transitions of the end-member material KNbO3. Although similar in the phase sequence, the actual temperatures observed for phase transition temperatures are significantly different from those observed in the literature for bulk samples. Namely, the tetragonal (ferroelectric) to cubic (paraelectric) phase transition is up to 50 K higher in the films when compared to bulk samples. This enhanced ferroelectricity is attributed to biaxial strain in the investigated thin films.

© 2010 American Institute of Physics

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KEYWORDS and PACS

PACS

  • 77.55.F-

    High-permittivity capacitive films

  • 81.30.Hd

    Constant-composition solid-solid phase transformations: polymorphic, massive, and order-disorder

  • 78.30.-j

    Infrared and Raman spectra

  • 77.80.-e

    Ferroelectricity and antiferroelectricity

ARTICLE DATA

PUBLICATION DATA

ISSN

0003-6951 (print)  
1077-3118 (online)

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