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18 Jan 2010

Volume 96, Issue 3, Articles (03xxxx)

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Appl. Phys. Lett. 96, 033101 (2010); http://dx.doi.org/10.1063/1.3291849 (3 pages)

Ferruccio Pisanello, Luigi Martiradonna, Godefroy Leménager, Piernicola Spinicelli, Angela Fiore, Liberato Manna, Jean-Pierre Hermier, Roberto Cingolani, Elisabeth Giacobino, Massimo De Vittorio, and Alberto Bramati
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Tailoring a plasma focus as hard x-ray source for imaging

S. Hussain, M. Shafiq, and M. Zakaullah

Appl. Phys. Lett. 96, 031501 (2010); http://dx.doi.org/10.1063/1.3291039 (3 pages) | Cited 2 times

Online Publication Date: 19 January 2010

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An investigation on temporal and spatial properties of hard x-rays (15–88 keV) emitted in a 5.3 kJ plasma focus using Si pin diodes and a pinhole camera is reported. The maximum yield of hard x-rays of 15–88 keV range is estimated about 4.7 J and corresponding efficiency for x-ray generation is 0.09%. The x-rays with energy >15 keV have 15–20 ns pulse duration and ∼ 1 mm source size. This radiation is used for contact x-ray imaging of biological and compound objects and spatial resolution of ∼ 50 μm is demonstrated.
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52.59.Px Hard X-ray sources
52.58.Lq Z-pinches, plasma focus, and other pinch devices
52.75.-d Plasma devices
52.77.-j Plasma applications
52.25.Os Emission, absorption, and scattering of electromagnetic radiation
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