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Applied Physics Letters / Volume 96 / Issue 4 / LASERS, OPTICS, AND OPTOELECTRONICS

Appl. Phys. Lett. 96, 041108 (2010); http://dx.doi.org/10.1063/1.3294627 (3 pages)

Two-photon fluorescence excitation with a microlens fabricated on the fused silica chip by femtosecond laser micromachining

Fei He1,2, Ya Cheng1, Lingling Qiao1,2, Chen Wang1, Zhizhan Xu1, Koji Sugioka3, Katsumi Midorikawa3, and Ji Wu4

1State Key Laboratory of High Field Laser Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, P.O. Box 800-211, Shanghai 201800, People's Republic of China
2Graduate School of the Chinese Academy of Sciences, Beijing 100039, People's Republic of China
3Laser Technology Laboratory, RIKEN—The Institute of Physical and Chemical Research, Hirosawa 2-1, Wako, Saitama 351-0198, Japan
4Department of Materials, Imperial College London, Exhibition Road, London SW7 2AZ, United Kingdom

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(Received 10 November 2009; accepted 29 December 2009; published online 28 January 2010)

We report on the fabrication of a microlens on a fused silica chip with excellent optical performance by femtosecond laser microfabrication. We show, both in theory and experimentally, that the fabricated microlens offers a high resolution approaching the optical diffraction limit. Moreover, two-photon excitation of fluorescence with the fabricated microlens is demonstrated. The lateral and axial resolutions of fluorescence are measured to be ∼ 1.7 and 12.3 μm, respectively.

© 2010 American Institute of Physics

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KEYWORDS and PACS

Keywords

fluorescence, high-speed optical techniques, laser beam machining, light diffraction, microlenses, micromachining, optical fabrication, silicon compounds, two-photon processes

PACS

  • 42.79.Bh

    Lenses, prisms and mirrors

  • 42.82.Cr

    Fabrication techniques; lithography, pattern transfer

  • 42.50.Hz

    Strong-field excitation of optical transitions in quantum systems; multiphoton processes; dynamic Stark shift

  • 42.65.Re

    Ultrafast processes; optical pulse generation and pulse compression

  • 42.62.Cf

    Industrial applications

ARTICLE DATA

Digital Object Identifier
http://dx.doi.org/10.1063/1.3294627

PUBLICATION DATA

ISSN

0003-6951 (print)  
1077-3118 (online)

Publisher

$abstract.society.value is a Member of CrossRef American Institute of Physics

For access to fully linked references, you need to log in.
    V. Maselli, R. Osellame, G. Cerullo, R. Ramponi, P. Laporta, L. Magagnin, and P. L. Cavallotti, Appl. Phys. Lett. 88, 191107 (2006)APPLAB000088000019191107000001.

    M. Watanabe, S. Juodkazis, H. Sun, S. Matsuo, and H. Misawa, Phys. Rev. B 60, 9959 (1999).


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