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15 Feb 2010

Volume 96, Issue 7, Articles (07xxxx)

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Appl. Phys. Lett. 96, 072501 (2010); http://dx.doi.org/10.1063/1.3314301 (3 pages)

T. Hesjedal and T. Phung
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Effects of rf-bias power on plasma parameters in a low gas pressure inductively coupled plasma

Hyo-Chang Lee, Min-Hyong Lee, and Chin-Wook Chung

Appl. Phys. Lett. 96, 071501 (2010); http://dx.doi.org/10.1063/1.3293295 (3 pages) | Cited 16 times

Online Publication Date: 17 February 2010

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Remarkable changes of the electron temperature and the plasma density by increasing bias power were observed in low gas pressure inductively coupled plasma (ICP) by the measurement of electron energy distribution function (EEDF). As the bias power increases, the electron temperature increased with accompanying the evolution of the EEDF from a bi-Maxwellian to a Maxwellian distribution. However, a different trend of the plasma density was observed with a dependence on the ICP powers. When the ICP power was relatively small or the discharge is in capacitive mode (E mode), the plasma density increased considerably with the bias power, while decrease of the plasma density was observed when the discharge is in inductive mode (H mode). The change of the plasma density can be explained by the balance between total power absorption and power dissipation.
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52.25.-b Plasma properties
52.35.Py Macroinstabilities (hydromagnetic, e.g., kink, fire-hose, mirror, ballooning, tearing, trapped-particle, flute, Rayleigh-Taylor, etc.)
52.80.-s Electric discharges

A high current density plasma cathode electron gun

Wenjie Fu, Yang Yan, Wenxu Li, Xiaoyun Li, and Jianqiang Wu

Appl. Phys. Lett. 96, 071502 (2010); http://dx.doi.org/10.1063/1.3310280 (3 pages) | Cited 1 time

Online Publication Date: 17 February 2010

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The design, performance, and characteristics of a plasma cathode electron gun are presented. The plasma cathode is based on a hollow cathode direct current discharge, and the electron beam is accelerated by pulse voltage. By discharging at high gas pressure and operating at low gas pressure, both the maximum accelerating voltage and maximum emitting current could be increased. Utilizing argon, with the accelerating voltage up to 9 kV and gas pressure down to 52 mPa, the gun is able to generate an electron beam of about 4.7 A, and the corresponding emitting current density is about 600 A/cm2.
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52.50.-b Plasma production and heating
52.80.-s Electric discharges
52.75.-d Plasma devices

O2(a mathg) production in flowing Ar–O2 surface-wave microwave discharges: Possible use for oxygen-iodine laser excitation

Vasco Guerra, Kinga Kutasi, and Paulo A. Sá

Appl. Phys. Lett. 96, 071503 (2010); http://dx.doi.org/10.1063/1.3318253 (3 pages) | Cited 6 times

Online Publication Date: 18 February 2010

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Herein we present the calculations conducted on an Ar–O2 surface-wave microwave discharge and its afterglow, and show that this system can be effectively used for the oxygen-iodine laser excitation. It is demonstrated that at pressures higher than 10 mbar O2(a) yields higher than the threshold yield required for positive gain can be achieved along the afterglow. Additionally, the density of O(math) atoms, which can quench the I(math1/2) excited state, can be tuned to the desired level.
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52.80.Pi High-frequency and RF discharges
52.80.Hc Glow; corona
82.33.Xj Plasma reactions (including flowing afterglow and electric discharges)
52.25.-b Plasma properties
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