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Appl. Phys. Lett. 96, 092101 (2010); http://dx.doi.org/10.1063/1.3352556 (3 pages)

Ultralow-threshold field emission from oriented nanostructured GaN films on Si substrate

Wei Zhao1, Ru-Zhi Wang1,2, Xue-Mei Song1, Hao Wang1, Bo Wang1, Hui Yan1, and Paul K. Chu2

1Laboratory of Thin Film Materials, College of Materials Science and Engineering, Beijing University of Technology, Beijing 100124, People's Republic of China
2Department of Physics and Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong

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(Received 8 January 2010; accepted 12 February 2010; published online 1 March 2010)

A series of nanostructured GaN Films have been prepared on Si substrates. Field emission measurements show that the oriented nanostructured GaN film with a thickness of 40 nm has an ultralow threshold field of 1.2 V/μm at 1 mA/cm2 and yields a stable emission current of 40 mA/cm2 at 2.8 V/μm, which is comparable to those of carbon nanotubes. A polarization field emission enhancement mechanism with ballistic electron transport is proposed to explain the origin of this ultralow-threshold field emission phenomenon.

© 2010 American Institute of Physics

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KEYWORDS and PACS

PACS

  • 79.70.+q

    Field emission, ionization, evaporation, and desorption

  • 73.50.Fq

    High-field and nonlinear effects

  • 73.61.Ey

    III-V semiconductors

ARTICLE DATA

PUBLICATION DATA

ISSN

0003-6951 (print)  
1077-3118 (online)

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