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Appl. Phys. Lett. 96, 092904 (2010); http://dx.doi.org/10.1063/1.3330897 (3 pages)

Microstress relaxation effect of Pb(Zr0.52Ti0.48)O3 films with thicknesses for micro/nanopiezoelectric device

Jeong Hoon Lee1, Kyo Seon Hwang2, and Tae Song Kim2

1Department of Electrical Engineering, Kwangwoon University, Seoul 139-701, Republic of Korea
2Nano-Bio Research Center, Korea Institute of Science and Technology, Seoul 136-791, Republic of Korea

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(Received 22 December 2009; accepted 2 February 2010; published online 4 March 2010)

In this study, we analyzed the microstress of Pb(Zr0.52Ti0.48)O3 (PZT) films using Raman spectrum and the macrostress using the wafer curvature method. Based on the stress analysis, we also determined the relationship between the residual stress and piezoelectric properties. We found that a thickness of 1 μm was critical since the stress relaxation starts due to surface roughening. Similarly, the film thickness dependence of the piezoelectric coefficient had saturation values around 1 μm, where the preferred orientation started to change from (111) to (110), indicating that the piezoelectric response was related to the stress relaxation with a preferred orientation change.

© 2010 American Institute of Physics

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KEYWORDS and PACS

PACS

  • 77.55.hj

    PZT

  • 68.55.jd

    Thickness

  • 68.55.jm

    Texture

  • 68.60.Bs

    Mechanical and acoustical properties

  • 62.40.+i

    Anelasticity, internal friction, stress relaxation, and mechanical resonances

  • 81.40.Jj

    Elasticity and anelasticity, stress-strain relations

  • 77.84.Cg

    PZT ceramics and other titanates

  • 77.65.Bn

    Piezoelectric and electrostrictive constants

ARTICLE DATA

PUBLICATION DATA

ISSN

0003-6951 (print)  
1077-3118 (online)

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