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Appl. Phys. Lett. 96, 093505 (2010); http://dx.doi.org/10.1063/1.3334724 (3 pages)

Light-Induced-Degradation effects in boron–phosphorus compensated n-type Czochralski silicon

T. Schutz-Kuchly, J. Veirman, S. Dubois, and D. R. Heslinga

CEA, LITEN, INES, 50 Avenue du Lac Léman, F-73377, Le Bourget du Lac, France

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(Received 15 January 2010; accepted 5 February 2010; published online 5 March 2010)

This letter focuses on the evolution under illumination of the carrier lifetime in n-type boron–phosphorus compensated Czochralski silicon. Our results show a Light-Induced-Degradation (LID) of the carrier lifetime which we prove to be related to additional boron. The activation energy of the annihilation mechanism for this boron-related defect was found to be 1.7 eV, in agreement with values concerning the annihilation of the BOi2 complex responsible for the LID of boron-doped p-type silicon. This strongly suggests that BOi2 are also responsible for the degradation of n-type boron–phosphorus compensated silicon unlike what was expected from previous studies on compensated p-type silicon.

© 2010 American Institute of Physics

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KEYWORDS and PACS

PACS

  • 72.20.Jv

    Charge carriers: generation, recombination, lifetime, and trapping

  • 72.40.+w

    Photoconduction and photovoltaic effects

  • 61.72.uf

    Ge and Si

ARTICLE DATA

PUBLICATION DATA

ISSN

0003-6951 (print)  
1077-3118 (online)

For access to fully linked references, you need to log in.
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    S. Dubois, N. Enjalbert, and J. P. Garandet, Appl. Phys. Lett. 93, 032114 (2008)APPLAB000093000003032114000001.

    D. W. Palmer, K. Bothe, and J. Schmidt, Phys. Rev. B 76, 035210 (2007).

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