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13 Sep 2010

Volume 97, Issue 11, Articles (11xxxx)

Issue Cover Spotlight Figure

Appl. Phys. Lett. 97, 113701 (2010); http://dx.doi.org/10.1063/1.3487998 (3 pages)

Sarah E. Baker, Michael D. Pocha, Allan S. P. Chang, Donald J. Sirbuly, Stefano Cabrini, Scott D. Dhuey, Tiziana C. Bond, and Sonia E. Létant
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Enhanced sensing performance by the plasmonic analog of electromagnetically induced transparency in active metamaterials

Zheng-Gao Dong, Hui Liu, Jing-Xiao Cao, Tao Li, Shu-Ming Wang, Shi-Ning Zhu, and X. Zhang

Appl. Phys. Lett. 97, 114101 (2010); http://dx.doi.org/10.1063/1.3488020 (3 pages) | Cited 16 times

Online Publication Date: 13 September 2010

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The gain-assisted plasmonic analog of electromagnetically induced transparency (EIT) in a metallic metamaterial is investigated for the purpose to enhance the sensing performance of the EIT-like plasmonic structure. The structure is composed of three bars in one unit, two of which are parallel to each other (dark quadrupolar element) but perpendicular to the third bar (bright dipolar element), The results show that, in addition to the high sensitivity to the refractive-index fluctuation of the surrounding medium, the figure of merit for such active EIT-like metamaterials can be greatly enhanced, which is attributed to the amplified narrow transparency peak.
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78.67.Pt Multilayers; superlattices; photonic structures; metamaterials
42.50.Md Optical transient phenomena: quantum beats, photon echo, free-induction decay, dephasings and revivals, optical nutation, and self-induced transparency
73.20.Mf Collective excitations (including excitons, polarons, plasmons and other charge-density excitations)
42.70.Nq Other nonlinear optical materials; photorefractive and semiconductor materials
78.20.Ci Optical constants (including refractive index, complex dielectric constant, absorption, reflection and transmission coefficients, emissivity)

Cooling rate and energy dependence of pulsed laser fabricated graphene on nickel at reduced temperature

A. T. T. Koh, Y. M. Foong, and Daniel H. C. Chua

Appl. Phys. Lett. 97, 114102 (2010); http://dx.doi.org/10.1063/1.3489993 (3 pages) | Cited 6 times

Online Publication Date: 14 September 2010

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Few-layer graphene was fabricated on nickel substrates using pulsed laser deposition at a relatively low temperature of 750 °C. The effects of cooling rate and laser energy on the ability to produce crystalline graphene layers were studied. It was observed that using a cooling rate of 1 and 50 °C/min produced few-layer graphene while the latter gave less defects. Laser energy was a less critical factor as long as the laser energy was below 100 mJ, however a higher laser energy was detrimental to the precipitation process. The mechanisms behind the observation of such phenomena are explained.
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68.65.Pq Graphene films
81.05.ue Graphene
81.15.Fg Pulsed laser ablation deposition
61.48.Gh Structure of graphene
81.30.Mh Solid-phase precipitation
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