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Applied Physics Letters / Volume 97 / Issue 14 / LASERS, OPTICS, AND OPTOELECTRONICS

Appl. Phys. Lett. 97, 141106 (2010); http://dx.doi.org/10.1063/1.3496463 (3 pages)

Experimental demonstration of locally oxidized hybrid silicon-plasmonic waveguide

Ilya Goykhman, Boris Desiatov, and Uriel Levy

Department of Applied Physics, The Benin School of Engineering and Computer Science, The Center for Nanoscience and Nanotechnology, The Hebrew University of Jerusalem, Jerusalem 91904, Israel

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(Received 1 August 2010; accepted 10 September 2010; published online 5 October 2010)

We experimentally demonstrate a self-aligned approach for the fabrication of nanoscale hybrid silicon-plasmonic waveguide fabricated by local oxidation of silicon (LOCOS). Implementation of the LOCOS technique provides compatibility with standard complementary metal-oxide-semiconductor technology and allows avoiding lateral misalignment between the silicon waveguide and the upper metallic layer. We directly measured the propagation and the coupling loss of the fabricated hybrid waveguide using a near-field scanning optical microscope. The demonstrated structure provides nanoscale confinement of light together with a reasonable propagation length of ∼ 100 μm. As such, it is expected to become an important building block in future on-chip optoelectronic circuitry.

© 2010 American Institute of Physics

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ARTICLE DATA

Digital Object Identifier
http://dx.doi.org/10.1063/1.3496463

PUBLICATION DATA

ISSN

0003-6951 (print)  
1077-3118 (online)

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$abstract.society.value is a Member of CrossRef American Institute of Physics

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    References

    G. Veronis and S. Fan, Appl. Phys. Lett. 87, 131102 (2005)APPLAB000087000013131102000001.


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