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11 Oct 2010

Volume 97, Issue 15, Articles (15xxxx)

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Appl. Phys. Lett. 97, 154101 (2010); http://dx.doi.org/10.1063/1.3479052 (3 pages)

Younggeun Park, Yeonho Choi, Debkishore Mitra, Taewook Kang, and Luke P. Lee
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Gas flow dependence of ground state atomic oxygen in plasma needle discharge at atmospheric pressure

Yukinori Sakiyama, Nikolas Knake, Daniel Schröder, Jörg Winter, Volker Schulz-von der Gathen, and David B. Graves

Appl. Phys. Lett. 97, 151501 (2010); http://dx.doi.org/10.1063/1.3496041 (3 pages) | Cited 3 times

Online Publication Date: 11 October 2010

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We present clear evidence that ground state atomic oxygen shows two patterns near a surface in the helium plasma needle discharge. Two-photon absorption laser-induced fluorescence spectroscopy, combined with gas flow simulation, was employed to obtain spatially-resolved ground state atomic oxygen densities. When the feed gas flow rate is low, the radial density peaks along the axis of the needle. At high flow rate, a ring-shaped density distribution appears. The peak density is on the order of 1021 m−3 in both cases. The results are consistent with a previous report of the flow-dependent bacterial killing pattern observed under similar conditions.
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52.30.-q Plasma dynamics and flow
52.25.-b Plasma properties
52.80.Tn Other gas discharges
52.65.-y Plasma simulation

An analytical formulation for the modified Paschen’s curve

Rakshit Tirumala and David B. Go

Appl. Phys. Lett. 97, 151502 (2010); http://dx.doi.org/10.1063/1.3497231 (3 pages) | Cited 15 times

Online Publication Date: 11 October 2010

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The modified Paschen’s curve describes the gaseous breakdown potential (voltage) in microscale gaps, when deviations from the traditional Paschen’s curve occur [ F. Paschen, Ann. Phys. 273, 69 (1889) ]. The deviation is due to ion-enhanced field emission that occurs in the high electric field of microgaps and acts as an additional cathode electron source. The present work derives an analytical formulation for the effect of ion-enhanced field emission and the modified Paschen’s curve that uses a consistent, single breakdown criterion. The proposed model does not require the fitting factor required in prior models and constitutes a single analytical equation for microscale breakdown and the modified Paschen’s curve.
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51.50.+v Electrical properties (ionization, breakdown, electron and ion mobility, etc.)
79.70.+q Field emission, ionization, evaporation, and desorption

Plasma-enabled growth of separated, vertically aligned copper-capped carbon nanocones on silicon

S. Kumar, I. Levchenko, M. Keidar, and K. Ostrikov

Appl. Phys. Lett. 97, 151503 (2010); http://dx.doi.org/10.1063/1.3502562 (3 pages) | Cited 9 times

Online Publication Date: 13 October 2010

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The formation of vertically aligned, clearly separated, copper-capped carbon nanocones with a length of up to 500 nm and base diameter of about 150 nm via three-stage process involving magnetron sputtering, N2 plasma treatment, and CH4+N2 plasma growth is studied. The width of gaps between the nanocones can be controlled by the gas composition. The nanocone formation mechanism is explained in terms of strong passivation of carbon in narrow gaps, where the access of plasma ions is hindered and the formation of large CnH2n+2 molecules is possible. This plasma-enabled approach can be used to fabricate nanoelectronic, nanofluidic, and optoelectronic components and devices.
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81.07.Bc Nanocrystalline materials
81.15.Cd Deposition by sputtering
81.65.Rv Passivation
61.46.-w Structure of nanoscale materials
52.77.Dq Plasma-based ion implantation and deposition
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