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Appl. Phys. Lett. 97, 042107 (2010); http://dx.doi.org/10.1063/1.3472204 (3 pages)

Monolithic n-type conductivity on low temperature grown freestanding ultrananocrystalline diamond films

P. T. Joseph1,2, N. H. Tai2, and I. N. Lin1

1Department of Physics, Tamkang University, Tamsui 251, Taiwan
2Department of Materials Science and Engineering, National Tsing-Hua University, Hsinchu 300, Taiwan

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(Received 13 February 2010; accepted 8 July 2010; published online 28 July 2010)

We report monolithic n-type conductivity on low-temperature (<570 °C) grown ultrananocrystalline diamond (UNCD) films by Li-diffusion (about 255 nm) from LiNbO3 substrates. Low resistivity of 1.2 Ω cm with carrier concentration of −2×1020 cm−3 is obtained on freestanding UNCD films. The films bonded to Cu-tape show very low turn-on field of 4.2 V/μm with emission current density of above 0.3 mA/cm2 at a low applied filed of 10 V/μm. The n-type conductivity of low-temperature Li-diffused UNCD films overwhelms that of the high-temperature ( ≥ 800 °C) nitrogen doped ones and will make a significant impact to diamond-based electronics.

© 2010 American Institute of Physics

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0003-6951 (print)  
1077-3118 (online)

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