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Applied Physics Letters / Volume 97 / Issue 5 / LASERS, OPTICS, AND OPTOELECTRONICS

Appl. Phys. Lett. 97, 051105 (2010); http://dx.doi.org/10.1063/1.3472112 (3 pages)

Two-photon subwavelength lithography with thermal light

De-Zhong Cao1, Gui-Ju Ge1, and Kaige Wang2

1Institute of Science and Technology for Opto-electric Information, Yantai University, Yantai 264005, People's Republic of China
2Department of Physics, Applied Optics Beijing Area Major Laboratory, Beijing Normal University, Beijing 100875, People's Republic of China

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(Received 18 May 2010; accepted 8 July 2010; published online 3 August 2010)

We propose an incoherent interferometer which can partly modify the spatial correlation property of thermal light. Applying the interferometer to the two-photon double-slit interference with thermal light, we find that the subwavelength interference patterns appear in the intensity correlation not only between two same polarized photons at different positions but also between two orthogonally polarized photons at the same position. The latter can correspond to the two-photon double-slit interference using a two-photon entangled source. Our experimental result suggests that a thermal light source is capable of accomplishing subwavelength lithography technique to surpass the Rayleigh resolution limit.

© 2010 American Institute of Physics

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KEYWORDS and PACS

Keywords

light interference, light interferometers, light polarisation, light sources, photolithography, Rayleigh scattering, thermo-optical effects, two-photon processes

PACS

ARTICLE DATA

Digital Object Identifier
http://dx.doi.org/10.1063/1.3472112

PUBLICATION DATA

ISSN

0003-6951 (print)  
1077-3118 (online)

Publisher

$abstract.society.value is a Member of CrossRef American Institute of Physics

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