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Appl. Phys. Lett. 97, 052106 (2010); http://dx.doi.org/10.1063/1.3477953 (3 pages)

Resistive switching transition induced by a voltage pulse in a Pt/NiO/Pt structure

Inrok Hwang1, Myung-Jae Lee2, Gyoung-Ho Buh3, Jieun Bae1, Jinsik Choi1, Jin-Soo Kim1, Sahwan Hong1, Yeon Soo Kim1, Ik-Su Byun1, Seung-Woong Lee1, Seung-Eon Ahn2, Bo Soo Kang4, Sung-Oong Kang1, and Bae Ho Park1

1Department of Physics, Division of Quantum Phases and Devices, Konkuk University, Seoul 143-701, Republic of Korea
2Samsung Advanced Institute of Technology, Suwon 440-600, Republic of Korea
3Semiconductor Examination Division, Korean Intellectural Property Office, Daejeon 302-701, Republic of Korea
4Department of Applied Physics, Hanyang University, Ansan 426-791, Republic of Korea

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(Received 29 June 2010; accepted 20 July 2010; published online 5 August 2010)

We have observed a switching transition between bistable memory switching and monostable threshold switching in Pt/NiO/Pt structure. Bistable memory switching could be changed to monostable threshold switching by applying a positive electrical pulse with height of 2 V and width between 10−2 and 10−4 s. The change is reversible by applying a negative electrical pulse with the same height and width. By considering polarity- and width-dependence of the switching transition and compositional difference on electrical properties in NiOx, we have proposed a model in which the migration of oxygen ions (O2−) is responsible for the switching transition in Pt/NiO/Pt structures.

© 2010 American Institute of Physics

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KEYWORDS and PACS

PACS

  • 73.40.Rw

    Metal-insulator-metal structures

  • 72.60.+g

    Mixed conductivity and conductivity transitions

  • 71.30.+h

    Metal-insulator transitions and other electronic transitions

ARTICLE DATA

PUBLICATION DATA

ISSN

0003-6951 (print)  
1077-3118 (online)

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