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Appl. Phys. Lett. 97, 053501 (2010); http://dx.doi.org/10.1063/1.3476337 (3 pages)

Transistor gating by polar molecular monolayers

O. Shaya, H. Einati, N. Fishelson, Y. Shacham-Diamand, and Y. Rosenwaks

School of Electrical Engineering, Faculty of Engineering, Tel-Aviv University, Ramat-Aviv 69978, Israel

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(Received 22 March 2010; accepted 7 July 2010; published online 4 August 2010)

In order to determine the role of polar monolayers in molecular-gated transistors we combine Kelvin probe force microscopy and current-voltage measurements of hybrid silicon-on-insulator metal-oxide-semiconductor field-effect transistors. Layers having alternating net-dipole direction were self-assembled on the top dielectric layer of the transistors. Nonzero field-effect was observed only with an amine-terminated monolayer and is attributed to the protonation of the amine groups. No correlation between the field-effect and the net-dipole of the molecular layers was found; this effect is discussed and explained.

© 2010 American Institute of Physics

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0003-6951 (print)  
1077-3118 (online)

For access to fully linked references, you need to log in.
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