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Applied Physics Letters / Volume 97 / Issue 8 / LASERS, OPTICS, AND OPTOELECTRONICS

Appl. Phys. Lett. 97, 081102 (2010); http://dx.doi.org/10.1063/1.3479419 (3 pages)

High aspect ratio nanochannel machining using single shot femtosecond Bessel beams

M. K. Bhuyan, F. Courvoisier, P. A. Lacourt, M. Jacquot, R. Salut, L. Furfaro, and J. M. Dudley

Département d’Optique P. M. Duffieux, Institut FEMTO-ST, UMR 6174, CNRS–Université de Franche-Comté, 16 route de Gray, 25030 Besançon Cedex, France

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(Received 18 June 2010; accepted 23 July 2010; published online 23 August 2010)

We report high aspect ratio nanochannel fabrication in glass using single-shot femtosecond Bessel beams of sub-3 μJ pulse energies at 800 nm. We obtain near-parallel nanochannels with diameters in the range 200–800 nm, and aspect ratios that can exceed 100. An array of 230 nm diameter channels with 1.6 μm pitch illustrates the reproducibility of this approach and the potential for writing periodic structures. We also report proof-of-principle machining of a through-channel of 400 nm diameter in a 43 μm thick membrane. These results represent a significant advance of femtosecond laser ablation technology into the nanometric regime.

© 2010 American Institute of Physics

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KEYWORDS and PACS

Keywords

glass, high-speed optical techniques, laser ablation, micromachining, nanofabrication

PACS

ARTICLE DATA

Digital Object Identifier
http://dx.doi.org/10.1063/1.3479419

PUBLICATION DATA

ISSN

0003-6951 (print)  
1077-3118 (online)

Publisher

$abstract.society.value is a Member of CrossRef American Institute of Physics

For access to fully linked references, you need to log in.
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    S. Juodkazis, K. Nishimura, S. Tanaka, H. Misawa, E. G. Gamaly, B. Luther-Davies, L. Hallo, P. Nicolai, and V. T. Tikhonchuk, Phys. Rev. Lett. 96, 166101 (2006).


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