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Applied Physics Letters / Volume 97 / Issue 8 / PLASMAS AND ELECTRICAL DISCHARGES

Appl. Phys. Lett. 97, 081501 (2010); http://dx.doi.org/10.1063/1.3481427 (3 pages)

The effect of secondary electrons on the separate control of ion energy and flux in dual-frequency capacitively coupled radio frequency discharges

Z. Donkó1, J. Schulze1,2, P. Hartmann1, I. Korolov1, U. Czarnetzki2, and E. Schüngel2

1Research Institute for Solid State Physics and Optics, Hungarian Academy of Sciences, P.O. Box 49, H-1525 Budapest, Hungary
2Institute for Plasma and Atomic Physics, Ruhr-University Bochum, 44801 Bochum, Germany

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(Received 8 July 2010; accepted 2 August 2010; published online 24 August 2010)

Dual-frequency capacitive discharges are used to separately control the mean ion energy, mathion, and flux, Γion, at the electrodes. We study the effect of secondary electrons on this separate control in argon discharges driven at 2+27 MHz at different pressures using Particle in Cell simulations. For secondary yield γ ≈ 0, Γion decreases as a function of the low frequency voltage amplitude due to the frequency coupling, while it increases at high γ due to the effective multiplication of secondary electrons inside the sheaths. Therefore, separate control is strongly limited. mathion increases with γ, which might allow an in situ determination of γ-coefficients.

© 2010 American Institute of Physics

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KEYWORDS and PACS

Keywords

argon, high-frequency discharges, plasma sheaths, plasma simulation, plasma sources, plasma transport processes

PACS

ARTICLE DATA

Digital Object Identifier
http://dx.doi.org/10.1063/1.3481427

PUBLICATION DATA

ISSN

0003-6951 (print)  
1077-3118 (online)

Publisher

$abstract.society.value is a Member of CrossRef American Institute of Physics

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