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Applied Physics Letters / Volume 97 / Issue 8 / PLASMAS AND ELECTRICAL DISCHARGES

Appl. Phys. Lett. 97, 081502 (2010); http://dx.doi.org/10.1063/1.3484961 (3 pages)

Production of high transient heat and particle fluxes in a linear plasma device

G. De Temmerman, J. J. Zielinski, H. van der Meiden, W. Melissen, and J. Rapp

FOM Institute for Plasma Physics Rijnhuizen, Association EURATOM-FOM, Trilateral Euregio Cluster, P.O. Box 1207, 3430 BE Nieuwegein, The Netherlands

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(Received 27 April 2010; accepted 11 August 2010; published online 27 August 2010)

We report on the generation of high transient heat and particle fluxes in a linear plasma device by pulsed operation of the plasma source. A capacitor bank is discharged into the source to transiently increase the discharge current up to 1.7 kA, allowing peak densities and temperature of 70×1020 m−3 and 6 eV corresponding to a surface power density of about 400 MW m−2.

© 2010 American Institute of Physics

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KEYWORDS and PACS

Keywords

discharges (electric), plasma density, plasma devices, plasma diagnostics, plasma sources, plasma temperature, plasma transport processes, plasma-wall interactions

PACS

  • 52.25.Fi

    Transport properties

  • 52.50.Dg

    Plasma sources

  • 52.25.Os

    Emission, absorption, and scattering of electromagnetic radiation

  • 52.40.Hf

    Plasma-material interactions; boundary layer effects

  • 52.70.Kz

    Optical (ultraviolet, visible, infrared) measurements

  • 52.80.-s

    Electric discharges

ARTICLE DATA

Digital Object Identifier
http://dx.doi.org/10.1063/1.3484961

PUBLICATION DATA

ISSN

0003-6951 (print)  
1077-3118 (online)

Publisher

$abstract.society.value is a Member of CrossRef American Institute of Physics

For access to fully linked references, you need to log in.
    S. Kajita, N. Ohno, S. Takamura, W. Sakaguchi, and D. Nishijima, Appl. Phys. Lett. 91, 261501 (2007)APPLAB000091000026261501000001.

    G. J. van Rooij, V. P. Veremiyenko, W. J. Goedheer, B. de Groot, A. W. Kleyn, P. H. M. Smeets, T. W. Versloot, D. G. Whyte, R. Engeln, D. C. Schram, and N. J. Lopes Cardozo, Appl. Phys. Lett. 90, 121501 (2007)APPLAB000090000012121501000001.

    W. A. J. Vijvers, C. A. J. van Gils, W. J. Goedheer, H. J. van der Meiden, D. C. Schram, V. P. Veremiyenko, J. Westerhout, N. J. Lopes Cardozo, and G. J. van Rooij, Phys. Plasmas 15, 093507 (2008)PHPAEN000015000009093507000001.

    H. J. van der Meiden, R. S. Al, C. J. Barth, A. J. H. Donné, R. Engeln, W. J. Goedheer, B. de Groot, A. W. Kleyn, W. R. Koppers, N. J. Lopes Cardozo, M. J. van de Pol, P. R. Prins, D. C. Schram, A. E. Shumack, P. H. M. Smeets, W. A. J. Vijvers, J. Westerhout, G. M. Wright, and G. J. van Rooij, Rev. Sci. Instrum. 79, 013505 (2008)RSINAK000079000001013505000001.


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