• Volume/Page
  • Keyword
  • DOI
  • Citation
  • Advanced
   
 
 
 

Flickr Twitter UniPHY Group iResearch App Facebook

Appl. Phys. Lett. 97, 081503 (2010); http://dx.doi.org/10.1063/1.3480409 (3 pages)

Effective design of multiple hollow cathode electrode to enhance the density of rf capacitively coupled plasma

H. S. Lee, Y. S. Lee, S. H. Seo, and H. Y. Chang

Department of Physics, Korea Advanced Institute of Science and Technology, Daejeon 305-701, Republic of Korea

View MapView Map

(Received 6 April 2010; accepted 28 July 2010; published online 27 August 2010)

Multiple-hole electrode rf capacitively coupled plasma is experimentally studied to determine the optimum condition for high-density plasma discharge. The plasma density was measured at various pressures, hole diameters, rf currents, and gas species conditions. The bulk plasma intrusion in the hole and the ionization avalanche in the sheath region facilitated high-density plasma generation when the diameter of the hole is slightly wider than triple the sheath length. The analytic design of the efficient multihole electrode for high-density rf capacitively coupled plasma discharge will be discussed.

© 2010 American Institute of Physics

RELATED DATABASES

To view database links for this article, you need to log in.

KEYWORDS and PACS

PACS

ARTICLE DATA

PUBLICATION DATA

ISSN

0003-6951 (print)  
1077-3118 (online)

For access to citing articles, you need to log in.


Figures (3)

Access to article objects (figures, tables, multimedia) requires a subscription; log in to view available files.
(Access to supplementary files, where available, is free for this journal.)



Close
Google Calendar
ADVERTISEMENT

close