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23 Aug 2010

Volume 97, Issue 8, Articles (08xxxx)

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Appl. Phys. Lett. 97, 081901 (2010); http://dx.doi.org/10.1063/1.3457448 (3 pages)

Zhaofeng Li, Rongkuo Zhao, Thomas Koschny, Maria Kafesaki, Kamil Boratay Alici, Evrim Colak, Humeyra Caglayan, Ekmel Ozbay, and C. M. Soukoulis
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The effect of secondary electrons on the separate control of ion energy and flux in dual-frequency capacitively coupled radio frequency discharges

Z. Donkó, J. Schulze, P. Hartmann, I. Korolov, U. Czarnetzki, and E. Schüngel

Appl. Phys. Lett. 97, 081501 (2010); http://dx.doi.org/10.1063/1.3481427 (3 pages) | Cited 17 times

Online Publication Date: 24 August 2010

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Dual-frequency capacitive discharges are used to separately control the mean ion energy, mathion, and flux, Γion, at the electrodes. We study the effect of secondary electrons on this separate control in argon discharges driven at 2+27 MHz at different pressures using Particle in Cell simulations. For secondary yield γ ≈ 0, Γion decreases as a function of the low frequency voltage amplitude due to the frequency coupling, while it increases at high γ due to the effective multiplication of secondary electrons inside the sheaths. Therefore, separate control is strongly limited. mathion increases with γ, which might allow an in situ determination of γ-coefficients.
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52.80.Pi High-frequency and RF discharges
52.65.Rr Particle-in-cell method
52.25.Fi Transport properties
52.40.Kh Plasma sheaths
52.50.Dg Plasma sources

Production of high transient heat and particle fluxes in a linear plasma device

G. De Temmerman, J. J. Zielinski, H. van der Meiden, W. Melissen, and J. Rapp

Appl. Phys. Lett. 97, 081502 (2010); http://dx.doi.org/10.1063/1.3484961 (3 pages) | Cited 10 times

Online Publication Date: 27 August 2010

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We report on the generation of high transient heat and particle fluxes in a linear plasma device by pulsed operation of the plasma source. A capacitor bank is discharged into the source to transiently increase the discharge current up to 1.7 kA, allowing peak densities and temperature of 70×1020 m−3 and 6 eV corresponding to a surface power density of about 400 MW m−2.
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52.25.Fi Transport properties
52.50.Dg Plasma sources
52.25.Os Emission, absorption, and scattering of electromagnetic radiation
52.40.Hf Plasma-material interactions; boundary layer effects
52.70.Kz Optical (ultraviolet, visible, infrared) measurements
52.80.-s Electric discharges

Effective design of multiple hollow cathode electrode to enhance the density of rf capacitively coupled plasma

H. S. Lee, Y. S. Lee, S. H. Seo, and H. Y. Chang

Appl. Phys. Lett. 97, 081503 (2010); http://dx.doi.org/10.1063/1.3480409 (3 pages) | Cited 5 times

Online Publication Date: 27 August 2010

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Multiple-hole electrode rf capacitively coupled plasma is experimentally studied to determine the optimum condition for high-density plasma discharge. The plasma density was measured at various pressures, hole diameters, rf currents, and gas species conditions. The bulk plasma intrusion in the hole and the ionization avalanche in the sheath region facilitated high-density plasma generation when the diameter of the hole is slightly wider than triple the sheath length. The analytic design of the efficient multihole electrode for high-density rf capacitively coupled plasma discharge will be discussed.
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52.80.Hc Glow; corona
52.40.Kh Plasma sheaths
52.25.Jm Ionization of plasmas
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