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Appl. Phys. Lett. 97, 091502 (2010); http://dx.doi.org/10.1063/1.3485051 (3 pages)

Electron-beam generation in a wide-aperture open gas discharge: A comparative study for different inert gases

P. A. Bokhan and Dm. E. Zakrevsky

Institute of Semiconductor Physics, Siberian Branch of the Russian Academy of Sciences, Prospekt Lavrent’eva 13, 630090 Novosibirsk, Russia

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(Received 23 June 2010; accepted 10 August 2010; published online 1 September 2010)

In the present study, electron-beam generation by open discharges was examined. The study was performed at gas pressures up to 20 Torr, and covered all inert gases. At voltages up to 8 kV, electron-beam currents up to 1600 A with current density ∼ 130 A/cm2 and a beam generation efficiency in excess of 93% were obtained. The production of electrons from cold cathode was concluded to be of photoemissive nature, enabling the production of high-intensity electron beams in any noble gas or in a mixture of a noble gas with molecular gases irrespective of cathode material.

© 2010 American Institute of Physics

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KEYWORDS and PACS

PACS

  • 52.25.Os

    Emission, absorption, and scattering of electromagnetic radiation

  • 52.80.-s

    Electric discharges

  • 52.50.Dg

    Plasma sources

ARTICLE DATA

PUBLICATION DATA

ISSN

0003-6951 (print)  
1077-3118 (online)

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    J. J. Rocca, J. D. Meyer, M. R. Farrel, and G. J. Collins, J. Appl. Phys. 56, 790 (1984)JAPIAU000056000003000790000001.

    E. V. Belskaya, P. A. Bokhan, and D. E. Zakrevsky, Appl. Phys. Lett. 93, 091503 (2008)APPLAB000093000009091503000001.

    S. V. Mitko, Y. Udalov, P. J. M. Peters, V. N. Ochkin, and K. -J. Boller, Appl. Phys. Lett. 83, 2760 (2003)APPLAB000083000014002760000001.

    W. Fu, Y. Yan, W. Li, X. Li, and J. Wu, Appl. Phys. Lett. 96, 071502 (2010)APPLAB000096000007071502000001.

    J. J. Rocca, J. D. Meyer, Z. Yu, M. Farrel, and G. J. Collins, Appl. Phys. Lett. 41, 811 (1982)APPLAB000041000009000811000001.

    E. Molva, R. Accomo, G. Labrunie, J. Cibert, C. Bodin, L. S. Dang, and G. Feuillet, Appl. Phys. Lett. 62, 796 (1993)APPLAB000062000008000796000001.

    D. Hervé, R. Accomo, E. Molva, L. Vanzetti, J. J. Paggel, L. Sorba, and A. Franciosi, Appl. Phys. Lett. 67, 2144 (1995)APPLAB000067000015002144000001.

    A. V. Phelps, Phys. Rev. 117, 619 (1960).

    A. P. Bokhan, P. A. Bokhan, and D. E. Zakrevsky, Appl. Phys. Lett. 86, 151503 (2005)APPLAB000086000015151503000001.


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